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Generation of soft X-rays and extreme ultraviolet (EUV) using a laser-irradiated gas puff target

Published online by Cambridge University Press:  30 August 2005

HENRYK FIEDOROWICZ
Affiliation:
Institute of Optoelectronics, Military University of Technology, Warsaw, Poland

Abstract

The paper gives a review of investigations on generation of soft X-rays and EUV using a gas puff target irradiated with high-power laser pulses performed during last few years. In the studies a newly developed double-stream gas puff target approach was used. The gas puff targets were irradiated with various lasers, including Nd:glass, Kr:F, Nd:YAG, and iodine lasers. The aim of the studies was to develop efficient and debris-free laser plasma X-ray and EUV sources for applications in microscopy, lithography, micro- and nanotechnology.

Type
Research Article
Copyright
© 2005 Cambridge University Press

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Footnotes

This paper was presented at the 28th ECLIM conference in Rome, Italy.

References

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