Hostname: page-component-76fb5796d-2lccl Total loading time: 0 Render date: 2024-04-27T12:59:12.828Z Has data issue: false hasContentIssue false
  • English
  • Français

The use of attachers in electron-beam sustained discharge switches—theoretical considerations

Published online by Cambridge University Press:  09 March 2009

G. Schaefer ,
K. H. Schoenbach ,
H. Krompholz ,
M. Kristiansen  and
A. H. Guenther
G. Schaefer
Affiliation:
Texas Tech University, Lubbock, TX 79409
K. H. Schoenbach
Affiliation:
Texas Tech University, Lubbock, TX 79409
H. Krompholz
Affiliation:
Texas Tech University, Lubbock, TX 79409
M. Kristiansen
Affiliation:
Texas Tech University, Lubbock, TX 79409
A. H. Guenther
Affiliation:
AFWL, Kirtland AFB, Albuquerque, NM 87117
Get access Rights & Permissions [Opens in a new window]

Abstract

Electron-beam sustained discharges can be used in opening and closing switch applications for producing bursts of energy in pulsed power systems. The incorporation of admixtures of attachers with low attachment rate at low values of E/N and high attachment rate at high values of E/N in the gaseous switch dielectric has been proposed to achieve low forward voltage drop in the conduction phase as well as rapid opening when the sustaining e-beam is terminated. This paper presents model calculations on the characteristics and transient behavior of an electron-beam sustained discharge in the high current density regime in N2. The influence of an attacher (N2O), with the property described above, and of the circuit parameters on the discharge is investigated as an illustrative example. The advantage of using such an attacher is demonstrated for the steady state conduction phases and for the opening phase, while the closing process is obstructed by the attacher. Additional possible control mechanisms, such as photodetachment to aid the closing process are discussed.

Type
Research Article
Information
Laser and Particle Beams , Volume 2 , Issue 3 , August 1984 , pp. 273 - 291
Copyright
Copyright © Cambridge University Press 1984

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Bletzinger, P. 1981 Proc. 3rd IEEE Int. Pulsed Power Conf.,Albuquerque, NM,81.Google Scholar
Bletzinger, P. 1983 Proc. 4th IEEE Pulsed Power Conf.,Albuquerque, NM.Google Scholar
Brown, R. T. & Nighan, W. L. 1979 Appl. Phys. Lett. 35, 142.CrossRefGoogle Scholar
Cartwright, D. C.Chutjian, A.Trajuar, S. & Williams, W. 1977 Phys. Rev. A, 6, 1041.CrossRefGoogle Scholar
Chantry, P. J. 1969 J. Chem. Phys. 51, 3369.CrossRefGoogle Scholar
Chantry, P. J. 1982 Workshop on Optical Control of Diffuse Discharges, University of Oregon.Google Scholar
Christophorou, L. G. 1971 Atomic and Molecular Radiation Physics, 247, Wiley-Interscience.Google Scholar
Christophorou, L. G.Hunter, S. R.Carter, J. G. & Mathis, R. A. 1982 Appl. Phys. Lett. 41, 147.CrossRefGoogle Scholar
Commisso, R. J.Fernsler, R. F.Scherrer, V. E. & Vitkovitsky, I. M. 1982 IEEE Trans. Plasma Sci., PS-10, 241.CrossRefGoogle Scholar
Commisso, R. J., Fernlser, R. F., Scherrer, V. E. & Vitkovitsky, I. M. 1983 Proc. 4th IEEE Pulsed Power Conf.,Albuquerque, NM.Google Scholar
Douglas-Hamilton, D. H. 1973 J. Chem. Phys. 58, 4820.CrossRefGoogle Scholar
Douglas-Hamilton, D. H. & Mani, S. A. 1974 J. Appl. Phys. 45, 4406.CrossRefGoogle Scholar
Dreye, J. W. & Perner, D. 1973 J. Chem. Phys. 58, 1195.CrossRefGoogle Scholar
Dzimianski, J. W. & Kline, L. E. 1980 Final Report, Air Force Contract F33615–78–C–2010, Report AFWAL–TR–80–2041.Google Scholar
Fernsler, R. F., Conte, D. & Vitkovitsky, I. M. 1980 IEEE Trans. Plasma Sci., PS-8, 176.CrossRefGoogle Scholar
Gallagher, J. W., Beaty, E. C., Dutton, J., Pitchford, L. C. 1982 JILA Info. Center Report 22, Boulder, CO.Google Scholar
Hallada, M. R., Bletzinger, P. & Bailey, W. F. 1982 IEEE Trans. Plasma Sci., PS-10, 224.Google Scholar
Harjes, H., Schoenbach, K., Schaefer, G., Krompholz, H., Kristiansen, M., Leiker, G. & Hatfield, L. 1983 Proc. 4th IEEE Pulsed Power Conf.,Albuquerque, NM.Google Scholar
Hunter, R. O. 1976 Proc. 1st IEEE Int. Pulsed Power Conf.,Lubbock, TX, Paper IC8.Google Scholar
Kline, L. E. 1982 IEEE Trans. Plasma Sci., PS-10, 224.CrossRefGoogle Scholar
Kovalchuk, B. M., Kremnev, V. V. & Mesyats, G. A. 1970 Sov. Phys.-Dokl., 15, 267.Google Scholar
Kovalchuk, B. M., Korolev, Yu. D., Kremnev, V. V. & Mesyats, G. A. 1976a Sov. Rad. Eng. Electron Phys., 21, 112.Google Scholar
Kovalchuk, B. M. & Mesyats, G. A. 1976 Proc. 1st IEEE Int. Pulsed Power Conf.,Lubbock, TX, Paper IC7.Google Scholar
Kristiansen, M. 1981 Proc. ARO Workshop on Repetitive Opening Switches, Tamarron, CO.Google Scholar
Kristiansen, M. & Schoenbach, K. H. 1981 Proc. ARO Workshop on Repetitive Opening Switches, Tamarron, CO, Texas Tech University, Dept. Elec. Eng., Lubbock, TX 79409. DTIC No. AD-A110770.Google Scholar
Kristiansen, M. & Schoenbach, K. H. 1982 Proc. ARO Workshop on Diffuse Discharge Opening Switches, Tamarron, CO, Texas Tech University, Dept. Elec. Eng., Lubbock, TX 79409. DTIC No. AD-A115883.Google Scholar
Krompholz, H., Schaefer, G. & Schoenbach, K. 1984 to be published.Google Scholar
Kukulin, V. I., Osipov, A. P. & Chuvillskii, Yu. M. 1979 Sov. Phys. Tech. Phys. 24, 883.Google Scholar
Lakshminarasimha, C. S., Lucas, J. & Snelson, R. A. 1975 Proc. Inst. Electr. Eng. 122, 1162.CrossRefGoogle Scholar
Lee, L. C. & Smith, P. G. 1979 J. Chem. Phys. 70, 1727.CrossRefGoogle Scholar
Lee, L. C., Chiang, C. C., Tang, K. Y., Huestis, D. L. & Lorents, D. C. 1981 Second Annual Report on AFOSR sponsored Coordinated Research Program in Pulsed Power Physics, Department of Electrical Engineering, Texas Tech University, Lubbock, TX. 189.Google Scholar
Long, W. H. 1979 J. Appl. Phys. 50, 168.CrossRefGoogle Scholar
Lorents, D. 1981 private communication.Google Scholar
Lowke, J. J. & Davis, D. K. 1977 J. Appl. Phys. 48, 4991.CrossRefGoogle Scholar
Lowry, J. F., Kline, L. E. & Heberlein, J. V. R. 1983 Proc. 4th IEEE Pulsed Power Conf.,Albuquerque, NM.Google Scholar
Morgan, W. L. & Pitchford, L.Private communication—to be published.Google Scholar
Phelps, A. V. 1982 private communication.Google Scholar
Pitchford, L. C. & Phelps, A. V. 1982 35th Gaseous Electronics Conf.,Dallas, TX.Google Scholar
Rapp, D. & Erlander-Golden, P. 1965 J. Chem. Phys. 43, 1464.CrossRefGoogle Scholar
Schaefer, G., Schoenbach, K. H., Tran, P., Wang, J.-S. & Guenther, A. H. 1983a Proc. 4th IEEE Pulsed Power Conf.,Albuquerque, NM.Google Scholar
Schaefer, G., Williams, P. F., Schoenbach, K. H. & Mosley, J. 1983b IEEE Trans. Plasma Sci. PS-11.Google Scholar
Schoenbach, K. H., Schaefer, G., Kristiansen, M., Hatfield, L. L. & Guenther, A. H. 1982 IEEE Trans. Plasma Sci., PS-10, 246.CrossRefGoogle Scholar
Tisone, G. C. & Branscomb, L. M. 1968 Phys. Rev. 170, 169.CrossRefGoogle Scholar
Watkins, D. A. 1958 Topics in Electromagnetic Theory, Wiley & Sons, New York.Google Scholar