Bartnik, A, Fiedorowicz, H, Jarocki, R, Kostecki, J, Szczurek, M and Wachulak, PW (2011) Laser-plasma EUV source dedicated for surface processing of polymers. Nuclear Instruments and Methods in Physics Research A 647, 125–131.
Bartnik, A, Fiedorowicz, H, Rakowski, R, Szczurek, M, Bijkerk, F, Bruijn, R and Fledderus, H (2001). Soft X-ray emission from a double stream gas puff target irradiated by a nanosecond laser pulse. Proceedings of SPIE, 2001, vol. 4424. ECLIM 2000: 26th European Conference on Laser Interaction with Matter, Milan Kálal, Karel Rohlena, 406 Milan Šinor, Editors.
Bartnik, A, Lisowski, W, Sobczak, J, Wachulak, P, Budner, B, Korczyc, B and Fiedorowicz, H (2012) Simultaneous treatment of polymer surface by EUV radiation and ionized nitrogen. Applied Physics A 109, 39–43.
Bartnik, A, Wachulak, P, Fok, T, Fiedorowicz, H, Pisarczyk, T, Chodukowski, T, Kalinowska, Z, Dudzak, R, Dostal, J, Krousky, E, Skala, J, Ullschmied, J, Hrebicek, J and Medrik, T (2015) Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems. Physics of Plasmas 22;4, 043302.
Bibinov, NK, Fateev, AA and Wiesemann, K (2001) Variations of the gas temperature in He/N2 barrier discharges. Plasma Sources, Science and Technology 10, 579–588.
Bogaerts, A, Neyts, E, Gijbels, R and van der Mullen, J (2002) Gas discharge plasmas and their applications. Spectrochimica Acta B 57, 609–658.
Camun-Aguilar, JF, Tereiro-Garcia, R and Sanchez-Uria, JE (1994) A comparative study of three microwave induced plasma sources for atomic emission spectrometry I. Excitation of mercury and its determination after on-line continuous cold vapor generation. Spectrochimica Acta B 49, 475–484.
Duan, Y, Li, Y, Tian, X, Zhang, H and Jin, Q (1994) Analytical performance of the microwave plasma torch in the determination of rare earth elements with optical emission spectrometry. Analytica Chimica Acta 295, 315–324.
Hegemann, D, Brunner, H and Oehr, C (2003) Plasma treatment of polymers for surface and adhesion improvement. Nuclear Instruments and Methods in Physics Research B, Beam Interaction with Materials and Atoms 208, 281.
Konuma, M. (1992) Film Deposition by Plasma Techniques. New York: Springer.
Korotkov, RY, Goff, T and Ricou, P (2007) Fluorination of polymethylmethacrylate with SF6 and hexafluoropropylene using dielectric barrier discharge system at atmospheric pressure. Surface & Coatings Technology 201, 7207–7215.
Kull, KR, Steen, ML and Fisher, ER (2005) Surface modification with nitrogen-containing plasmas to produce hydrophilic, low-fouling membranes. Journal of Membrane Science 246, 203.
Kumar, M and Ando, Y (2010) Chemical Vapor Deposition of Carbon Nanotubes: A Review on Growth Mechanism and Mass Production. Journal of Nanoscience and Nanotechnology 10, 3739–3758.
Lai, JN, Sunderland, B, Xue, JM, Yan, S, Zhao, WJ, Folkard, M, Michael, BD and Wang, YG (2006) Study on hydrophilicity of polymer surfaces improved by plasma treatment. Applications of Surface Science 252, 3375.
Lallement, L, Gosse, C, Cardinaud, C, Peignon-Fernandez, M-C and Rhallabi, A (2010) Etching studies of silica glasses in SF6/Ar SF6/Ar inductively coupled plasmas: Implications for microfluidic devices fabrication. Journal of Vacuum Science & Technology A 28, 277.
Liang, F, Zhang, DX, Lei, YH, Zhang, HQ and Jin, QH (1995) Determination of Selected Noble Metals by MPT-AES Using a Pneumatic Nebulizer. Microchemical Journal 52, 181–187.
Lieberman, MA (1999) Plasma discharges for materials processing and display applications. In Schluter, H and Shivarova, A (eds). Advanced Technologies Based on Wave and Beam Generated Plasmas, NATO Science Series, vol. 67. Dordrecht: Kluwer, 1999, pp. 1–22.
Lofthus, A and Krupenie, PH (1977) The spectrum of molecular nitrogen. Journal of Physical and Chemical Reference Data 6, 113–307.
Manos, DM and Flamm, DL (1989). Plasma Etching: An Introduction. Academic Press: New York.
Ogura, K, Yamada, H, Sato, Y and Okamoto, Y (1997) Excitation temperature in high-power nitrogen microwave-induced plasma at atmospheric pressure. Applied Spectroscopy 51, 1496–1499.
Plank, NOV, Blauw, MA, van der Drift, EWJM and Cheung, R (2003) The etching of silicon carbide in inductively coupled SF6/O2 plasma. Journal of Physics D 36, 482–487.
Ralchenko, Y, Janev, RK, Kato, T, Fursa, DV, Bray, I and de Heer, FJ (2008) Electron-impact excitation and ionization cross sections for ground state and excited helium atoms. Atomic Data and Nuclear Data Tables 94, 603–622.
Rangel, EC, Bento, WCA, Kayama, ME, Schreiner, WH and Cruz, NC (2003) Enhancement of polymer hydrophobicity by SF6 plasma treatment and argon plasma immersion ion implantation. Surface and Interface Analysis 35, 179–183.
Samukawa, S and Mieno, T (1996) Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching. Plasma Sources, Science and Technology 5, 132–113.
Tajima, S and Komvopoulos, K (2006) Effect of reactive species on surface crosslinking of plasma-treated polymers investigated by surface force microscopy. Applied Physics Letters 89, 124102.
Xia, Y, Liu, B, Zhong, S and Li, C (2012) X-ray photoelectron spectroscopic studies of black silicon for solar cell. Journal of Electron Spectroscopy and Related Phenomena 184, 589–592.
Yoshida, S, Hagiwara, K, Hasebe, T and Hotta, A (2013) Surface modification of polymers by plasma treatments for the enhancement of biocompatibility and controlled drug release. Surface & Coatings Technology 233, 99–107.