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Measurement of multiphoton absorption and electron avalanche in optical thin films

Published online by Cambridge University Press:  09 March 2009

H. Nishioka ,
T. Kawasumi ,
K. Ueda  and
H. Takuma
H. Nishioka
Affiliation:
Institute for Laser Science, University of Electro-Communications, 1–5–1 Chofugaoka, Chofu, Tokyo 182, Japan
T. Kawasumi
Affiliation:
Institute for Laser Science, University of Electro-Communications, 1–5–1 Chofugaoka, Chofu, Tokyo 182, Japan
K. Ueda
Affiliation:
Institute for Laser Science, University of Electro-Communications, 1–5–1 Chofugaoka, Chofu, Tokyo 182, Japan
H. Takuma
Affiliation:
Institute for Laser Science, University of Electro-Communications, 1–5–1 Chofugaoka, Chofu, Tokyo 182, Japan
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Abstract

Measurements on nonlinear processes caused by multiphoton absorption and electron avalanche in optical thin films have been carried out using KrF lasers of 20-ns and 1.7-ps pulse duration. Multiphoton absorption of the order of 10-7 J was detected by a photoacoustic signal, and the nonlinear growth of photo-induced current due to the electron avalanche was analyzed dynamically. The correlation between damage threshold and carrier lifetime was investigated for oxide and fluoride coatings.

Information

Type
Research Article
Information
Laser and Particle Beams , Volume 11 , Issue 1 , March 1993 , pp. 55 - 64
Copyright
Copyright © Cambridge University Press 1993

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References

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