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Direct Patterning of Ionic Polymers with E-BeamLithography

Published online by Cambridge University Press:  26 January 2016

Annina M. Steinbach*
Affiliation:
Institute of Electron Devices and Circuits, Ulm University, Albert-Einstein-Allee 45, 89069 Ulm, Germany
Stefan Jenisch
Affiliation:
Institute of Electron Devices and Circuits, Ulm University, Albert-Einstein-Allee 45, 89069 Ulm, Germany
Parisa Bakhtiarpour
Affiliation:
Institute of Experimental Physics, Ulm University, Albert-Einstein-Allee 11, 89069 Ulm, Germany
Masoud Amirkhani
Affiliation:
Institute of Experimental Physics, Ulm University, Albert-Einstein-Allee 11, 89069 Ulm, Germany
Steffen Strehle
Affiliation:
Institute of Electron Devices and Circuits, Ulm University, Albert-Einstein-Allee 45, 89069 Ulm, Germany
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Abstract

Controlling the bending properties of ionic polymer-metal composites mayimmediately affect their implementation in robotics and medicine. In the presentwork, we propose a direct patterning method for the ionic polymer Nafion usingconventional electron-beam writing. In a proof-of-concept study, we show thatpatterns of arbitrary geometry and sizes between 1 µm and 50µm can be engraved into the polymer surface without using resists.Pattern depth can be deliberately controlled by adjusting the exposure dose. Thepatterns were stable even after prolonged immersion in ionic solution. Thepresented technique therefore opens up the possibility to create uniqueelectrode geometries and to investigate independently the effect of patternsize, density, depth as well as geometry on ionic polymer-metal compositebending.

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Copyright
Copyright © Materials Research Society 2016 

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