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Fabrication of Diamond-Like Carbon Emitter Patterns byRoom-Temperature Curing Nanoimprint Lithography with PDMS Molds UsingPolysiloxane

Published online by Cambridge University Press:  26 January 2016

Shuji Kiyohara ,
Shogo Yoshida ,
Ippei Ishikawa ,
Toru Harigai ,
Hirofumi Takikawa ,
Masahiko Watanabe ,
Yoshinari Sugiyama ,
Yukiko Omata  and
Yuichi Kurashima
Shuji Kiyohara
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Shogo Yoshida*
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Ippei Ishikawa
Affiliation:
Electric and Electron System Engineering Course, Department of Multidisciplinary Engineering, Faculty of Advanced Engineering, National Institute of Technology, Maizuru College, 234 Aza Shiroya, Maizuru, Kyoto 625-8511, Japan
Toru Harigai
Affiliation:
Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka Tempaku, Toyohashi, Aichi 441-8580, Japan
Hirofumi Takikawa
Affiliation:
Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka Tempaku, Toyohashi, Aichi 441-8580, Japan
Masahiko Watanabe
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yoshinari Sugiyama
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yukiko Omata
Affiliation:
Application and Technical Section, ELIONIX INC., 3-7-6 Motoyokoyama, Hachioji, Tokyo 192-0063, Japan
Yuichi Kurashima
Affiliation:
Research Center for Ubiquitous MEMS and Micro Engineering, National Institute of Advanced Industrial Science and Technology, 1-2-1 Namiki, Tsukuba, Ibaraki 305-8564, Japan
*
*(Email: a0344@g.maizuru-ct.ac.jp)
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Abstract

We investigated the fabrication of diamond-like carbon (DLC) emitter patterns byroom-temperature curing nanoimprint lithography (RTC-NIL) withpolydimethylsiloxane (PDMS) molds using polysiloxane, as an application to theemitter for the next generation flat panel display.

The DLC which has excellent properties similar to diamond properties was used asa pattern material. A PDMS was used as a mold material and fabricated by thefollowing optimum conditions of the first curing time at RT for 36 h and thesecond curing time at the temperature of 150 °C for 15 mins. Thepolysiloxane is in the state of sticky liquid at RT and stable in air.Therefore, the polysiloxane was used the electron beam (EB) resist and oxidemask material in EB lithography, and also used as RT-imprint material.

First, we fabricated the PDMS mold with pit array. Each dot is 5µm-diameter and 400 nm-depth. We carried out the RTC-NIL process withPDMS molds using polysiloxane under the following optimum imprint conditions of0.5 MPa-imprinting pressure, 1.5 min-the time between spin-coat and imprint, and5 min-imprinting time. Next, the residual layer of imprinted polysiloxanepattern was 450 nm and then was removed with electron cyclotron resonance (ECR)trifluoromethane (CHF3) ion shower under the conditions of 300 eV-ionenergy and 3 min-etching time. Then, we processed the imprinted polysiloxanepatterns on the DLC film with an ECR oxygen (O2) ion shower under theconditions of 400 eV-ion energy and 12 min-etching time. As a result, wesucceeded in fabricating convex DLC emitter patterns with high accuracy whichhas 5 µm-diameter and 500 nm-height.

Keywords

diamondmicrostructurereactive ion etching

Information

Type
Articles
Information
MRS Advances , Volume 1 , Issue 16: Electronics and Photonics , 2016 , pp. 1075 - 1080
Copyright
Copyright © Materials Research Society 2016 

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References

REFERENCES

Kleps, I., Angelescu, A., Samfirescu, N., Gil, A., Correia, A., Solid-State Electron., 45, 997 (2001).Google Scholar
Cirino, G.A., Mansono, R.D., Verdonck, P., Jasinevicius, R.G., Neto, L.G., Surf. Coat. Technol., 204, 18 (2010).Google Scholar
Chou, S.Y., Krauss, P.R., Renstrom, P.J., Appl. Phys. Lett., 67, 3114 (1995).Google Scholar
Kiyohara, S., Araki, S., Kurashima, Y., Taguchi, Y., Sugiyama, Y. and Omata, Y., J. Mater. Sci. Mater. Electron., 22, 183 (2010).Google Scholar
Kamiya, M., Tanoue, H., Takikawa, H., Taki, M., Hasegawa, Y., and Kumagai, M., Vucuum, 83, 510 (2009).CrossRefGoogle Scholar
Kiyohara, S., Ikegaki, T., Ito, C., Ishikawa, I., Tanoue, H., Takikawa, H., Taguchi, Y., Sugiyama, Y., Omata, Y. and Kurashima, Y., edited by Amault, J.C., Williams, O.A., Swain, G.M., Nesladek, M. and Loh, K.P., (Mater. Res. Soc. Symp. Proc. 1511, Boston, MA, 2013) mrsf12-1511-ee05-03.Google Scholar
Suganuma, T., J. Electron Microsc., 34, 328 (1985).Google Scholar
Kiyohara, S., Ito, C., Ishikawa, I., Takikawa, H., Taguchi, Y., Sugiyama, Y., Omata, Y. and Kurashima, Y., edited by Bergonzo, P., Jackman, R.B., Loh, K.P., Swain, G.M. and Williams, O.A., (Mater. Res. Soc. Symp. Proc. 1395, Boston, MA, 2012) pp.27–32.Google Scholar