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Pre-Patterned CVD Graphene: Insights on ALD deposition parameters and their influence on Al2O3 and graphene layers

  • Gabriela B. Barin (a1) (a2), Antonio G. Souza Filho (a3), Ledjane S. Barreto (a2) and Jing Kong (a1)

Fabrication of graphene nanostructures it is important for both investigating their intrinsic physical properties and applying them into various functional devices. In this work we present a study on atomic layer deposition (ALD) of Al2O3 to produce patterned graphene through area-selective chemical vapor deposition (CVD) growth. A systematic parametric study was conducted to determine how the number of cycles and the purging time affect the morphology and the electrical properties of both graphene and Al2O3 layers.

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1. Liu, L.H., Zorn, G., Castner, D.G., Solanki, R., Lerner, M.M., Yan, M., J.Mat. Chem 20, 5041 (2010).
2. Lin, Y.M., Dimitrakopoulos, C., Jenkins, K.A., Farmer, D.B., Chiu, H-Y., Grill, A., Avouris, Ph., Science. 327, 662 (2010).
3. Li, H., Xu, C., Srivastava, N., Banerjee, K., IEEE Trans on Elec Devices. 56, 1799 (2009).
4. Kim, K.S., Zhao, Y., Jang, H., Yoon Lee, S., Kim, J.M., Kim, K.S., Ahn, J-H, Kim, P., Choi, J-Y, Hong, B.H, Nature. 457, 706 (2009).
5. Han, M. Y., Ozyilmaz, B., Zhang, Y., Kim, P., Physical Review Letters. 98, 206 (2007).
6. Hofmann, M., Hsieh, Y.P., Hsu, A.L., Kong, J., Nanoscale. 6, 289 (2013).
7. Xu, Z., Gao, C., ACS Nano. 5, 2908 (2011).
8. Kwon, S., Kim, T., Kim, Y., Byun, M., Lin, Z., Suh, K., Yoon, D., Yang, W.,Soft Matter.7, 6811 (2011).
9. Safron, N., Kim, M., Gopalan, P., Arnold, M.S., Advanced Materials. 24, 1041( 2012).
10. Barin, GB, Song, Y, Gimenez, I.F, Souza Filho, AG, Barreto, L.S., Kong, J., Carbon. 84,82 (2015)
11. Ferrari, A. C., Meyer, J. C., Scardaci, V., Casiraghi, C., Lazzeri, M., Mauri, F., Piscanec, S., Jiang, D., Novoselov, K. S., Roth, S., and Geim, A. K., Phys Rev Let. 97, 187 ( 2006).
12. Cheng, Z., Zhou, Q., Wang, C., Li, Q., Wang, C., Fang, Y., Nano Letters. 11, 767 (2011)
13. Berciaud, S., Ryu, S., Brus, L.E., Heinz, T.F., Nano Letters. 9, 346 (2009)14.
14. Ryu, S., Liu, L., Berciaud, S., Yu, Y-J, Liu, H., Kim, P., Flynn, G. W., Brus, L.E, Nano Letters. 10, 4944 (2010)
15. Miikkulainen, V., Leskelä, M., Ritala, M., Puurunen, R.L., J.of App Phys. 113, 021301 (2013).
16. Puurunen, R.L., Journal of Applied Physics, 97, 121 (2005).
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MRS Advances
  • ISSN: -
  • EISSN: 2059-8521
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