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Laser-Crystallized High Quality ITO on Plastic Substrates for Flexible Displays

Published online by Cambridge University Press:  15 February 2011

Wonsuk Chung
FlexICs, Inc., 165 Topaz Street, Milpitas, CA 95035
Paul Wickboldt
FlexICs, Inc., 165 Topaz Street, Milpitas, CA 95035
Daniel Toet
FlexICs, Inc., 165 Topaz Street, Milpitas, CA 95035
Paul G. Carey
FlexICs, Inc., 165 Topaz Street, Milpitas, CA 95035
Michael O. Thompson
Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853
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In the study presented here, we successfully demonstrated that high quality ITO films could be obtained on plastic substrates using Excimer laser crystallization. ITO films were first deposited at 10 °C on PEN substrates by DC magnetron sputtering, and then irradiated using a homogenized pulsed XeCl excimer laser beam (308 nm, 35 ns pulse duration) in a vacuum chamber. It was possible to reliably attain Type I ITO films with sheet resistances down to 35 Ω/΢, combined with 80 % optical transmittance in visible range. Well defined 2 μm lines could be obtained using simple HCl etchant at room temperature. We also developed Type II ITO films with a sheet resistance of 15 Ω/΢ and an optical transmittance of 80 % by means of laser annealing on plastic substrates, although these materials were found inferior to Type I in etching properties.

Research Article
Copyright © Materials Research Society 2003

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