Hostname: page-component-76fb5796d-dfsvx Total loading time: 0 Render date: 2024-04-30T02:27:54.747Z Has data issue: false hasContentIssue false
  • English
  • Français

Light-Induced Changes Among Fast-Relaxing Hydrogens in Plasma-Deposited Hydrogenated Amorphous Silicon

Published online by Cambridge University Press:  15 February 2011

M. J. Kernan ,
R. L. Corey ,
P. A. Fedders ,
D. J. Leopold ,
R. E. Norberg ,
W. A. Turner  and
W. Paul
M. J. Kernan
Affiliation:
Department of Physics, Washington University, St. Louis, MO 63130
R. L. Corey
Affiliation:
Department of Physics, Washington University, St. Louis, MO 63130
P. A. Fedders
Affiliation:
Department of Physics, Washington University, St. Louis, MO 63130
D. J. Leopold
Affiliation:
Department of Physics, Washington University, St. Louis, MO 63130
R. E. Norberg
Affiliation:
Department of Physics, Washington University, St. Louis, MO 63130
W. A. Turner
Affiliation:
Division of Applied Science, Harvard University, Cambridge, MA 02138
W. Paul
Affiliation:
Division of Applied Science, Harvard University, Cambridge, MA 02138
Get access

Abstract

Light-induced rearrangements in a-Si:H,D during and after illumination have been studied by deuteron magnetic resonance (DMR). A film sample was deposited on a 230°C Al substrate by plasma decomposition of S1H4 and D2. The high quality film contained 4 at.% H and 4 at. % D. DMR spectra of fast-relaxing components were examined at 700 msec or less after radio frequency saturation. At 30 K these showed a broad central signal (primarily nanovoid-trapped HD and D2), part of which shifted paramagnetically during illumination. No comparable shifts were shown by spectral components from Si-bonded hydrogen or from microvoid-contained dense fluid hydrogen. The observed post-illumination shifts vanished upon 150°C dark anneal and reflected light-induced metastable magnetic changes in the surroundings of hydrogen trapped in nanovoids.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 377: Symposium A – Amorphous Silicon Technology 1995 , 1995 , 395
Copyright
Copyright © Materials Research Society 1995

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Norberg, R. E., Bodart, J., Corey, R., Fedders, P. A., Paul, W., Turner, W. A., Pang, D., and Wetsel, A., Mat. Res. Soc. Proc. 258, 377 (1992).Google Scholar
2. Volz, M. P., Santos-Filho, P., Conradi, M. S., Fedders, P. A., Norberg, R. E., Turner, W., and Paul, W., Phys. Rev. Lett. 63, 2582 (1989).Google Scholar