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Magnetic Film Analysis by RBS, PIXE, HFS and NRA

Published online by Cambridge University Press:  01 February 2011

Luncun Wei
Luncun Wei*
Affiliation:
Charles Evans Associates 810 Kifer Road, Sunnyvale, CA 94086
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Abstract

Characterization of thin magnetic coating layer is always challenging, different analytical methods are required to characterize layer structure and composition. In the present paper, Rutherford backscattering (RBS)[1], particle induced x-ray emission (PIXE)[2], hydrogen forward scattering (HFS)[3] and nuclear reaction analysis (NRA)[4] are used to measure three typical magnetic film structures and coating layer. Carbon, oxygen, nitrogen contents are measured by deuteron NRA and hydrogen content by HFS. Magnetic layers beneath diamond-like carbon (DLC) layer are characterized by RBS and PIXE: PIXE for relative ratios of Cr, Fe, Co and Ni, and RBS for thickness and depth profiles. The analytical results of one test example shown in this paper demonstrate that the combination of these four methods can give complete and precise layer structure and composition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 721: Symposia E/J – Texture and Microstructure in Electronic and Magnetic Films – Nanostructural Magnetic Materials for Data Storage , 2002 , J4.5
Copyright
Copyright © Materials Research Society 2002

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References

1. Chu, W-K., Mayer, J. W. and Nicolet, M- A., “Backscattering Spectrometry”, Academic Press, New York (1978).Google Scholar
2. Johansson, S. A. E. and Campbell, D. L., “PIXE: A Novel Technique for Elemental Analysis”, John Wiley & Sons Ltd., Chichester (1988).Google Scholar
3. Bird, J.R. and Williams, J. S., “Ion Beam Materials Analysis”, Academic Press, New York (1989).Google Scholar
4. Tesmer, J. R. and Nastasi, M., “Handbook of Modern Ion Beam Materials Analysis”, Materials Research Society, Pittsburgh, Pennsylvania (1995).Google Scholar