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Measurement and Modeling of Atomic Chlorine Concentrations in Plasma Processes

Published online by Cambridge University Press:  22 February 2011

Jean-Philippe Nicolai ,
Kenneth D. Allen  and
Herbert H. Sawin
Jean-Philippe Nicolai
Affiliation:
Massachusetts Institute of Technology, Dept. of Chemical Engineering, Cambridge, MA 02139
Kenneth D. Allen
Affiliation:
Honeywell SSED, 12001 State Highway 55, Plymouth, MN 55441
Herbert H. Sawin
Affiliation:
Massachusetts Institute of Technology, Dept. of Chemical Engineering, Cambridge, MA 02139
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Abstract

Spatially resolved concentration profiles of ground-state chlorine atoms were measured in CF3 Cl/Ar RF plasmas using two-photon laser induced fluorescence. A significant Cl gradient was found between the two electrodes under conditions typical for plasma etching. This experimental observation is consistent with previous model predictions which assumed the primary loss of Cl was a second-order surface recombination on the upper electrode which is partially limited by gaseous diffusion.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 117: Symposium C – Process Diagnostics: Materials, Combustion, Fusion , 1988 , 35
Copyright
Copyright © Materials Research Society 1988

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