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Molecular Dynamics Study on Resolution in Nanoimprint Lithography for Glass Material

Published online by Cambridge University Press:  31 January 2011

Kazuhiro Tada ,
Masaaki Yasuda ,
Yoshihisa Kimoto ,
Hiroaki Kawata  and
Yoshihiko Hirai
Kazuhiro Tada
Affiliation:
tada-5@pe.osakafu-u.ac.jp, Department of Physics and Electronics, Graduate school of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai, 599-8531, Japan
Masaaki Yasuda
Affiliation:
yasuda@pe.osakafu-u.ac.jp, Osaka Prefecture University, Department of Physics and Electronics, Sakai, Japan
Yoshihisa Kimoto
Affiliation:
kimoto@pe.osakafu-u.ac.jp, Osaka Prefecture University, Department of Physics and Electronics, Sakai, Japan
Hiroaki Kawata
Affiliation:
kawata@pe.osakafu-u.ac.jp, Osaka Prefecture University, Department of Physics and Electronics, Sakai, Japan
Yoshihiko Hirai
Affiliation:
hirai@pe.osakafu-u.ac.jp, Osaka Prefecture University, Department of Physics and Electronics, Sakai, Japan
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Abstract

A theoretical study of resolution in nanoimprint lithography (NIL) has been carried out using molecular dynamics (MD) simulation. We have performed a MD simulation for glass NIL, monitored the friction force during entire NIL process and evaluated the deformed shapes of glass patterns after the mold releasing. The resolution in NIL is governed by the maximum tensile stress acting on the glass, which is induced by the friction force during the mold releasing. Based on the distribution of average number density of atoms in the molded glass, the ultimate resolution in the glass NIL has been proved to be 0.4 nm.

Keywords

nanoscalesimulationhot pressing

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