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Progress Towards a High-Resolution X-Ray Photon Counter

Published online by Cambridge University Press:  10 February 2011

R. B. Apte ,
N. Nickel ,
R. A. Street ,
R. Weisfield ,
J. X.-D. Wu ,
S. Ready ,
M. Nguyen  and
P. Nylen
R. B. Apte
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
N. Nickel
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
R. A. Street
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
R. Weisfield
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
J. X.-D. Wu
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
S. Ready
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
M. Nguyen
Affiliation:
Xerox Palo Alto Research Center, Palo Alto, CA 94304
P. Nylen
Affiliation:
Department of Physics, University of Stockholm, Sweden
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Abstract

Progress towards x-ray shot-noise limited imaging with resolution superior to film is reported for a large format amorphous silicon imaging system containing 1536x 1920 pixels. Improvements over previous work include the development of a complete system, the use of charge-sensitive amplifiers, and careful control of extrinsic noise. A charge-sensitive amplifier with 1000:1 dynamic range is used to detect the signal in the presence of a large parasitic capacitance, 95pF, which both increases the intrinsic noise in the amplifier and technical noise coupled from other sources. The RMS noise level, 4200 e, is within two octaves of single x-ray counting.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 420: Symposium A – Amorphous Silicon Technology-1996 , 1996 , 177
Copyright
Copyright © Materials Research Society 1996

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