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Altering Resistivity in Diamond Films Without Impurity Addition

Published online by Cambridge University Press:  10 February 2011

Colin C. Baker
Affiliation:
Department of Chemical Engineering, Worcester Polytechnic Institute, Worcester, MA, USA 01609mcnamara@wpi.edu
Karen M. McNamara
Affiliation:
Department of Chemical Engineering, Worcester Polytechnic Institute, Worcester, MA, USA 01609mcnamara@wpi.edu
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Abstract

CVD Diamond films with resistivites comparable to that measured in natural type IIA diamond can be fabricated using a microwave-plasma assisted growth environment. Modification of the resistivity of these films is typically accomplished through the introduction of impurities, or dopants such as boron. Some applications, however, require that the purity of the carbon lattice be maintained, while still altering the resistivity of the film. This is the case for many applications of diamond in space. Here, varying the resistivity of CVD diamond is investigated by controlling the introduction of sp2coordinated bonds, yet maintaining the overall diamond structure and carbon purity. Experimental results will be presented, and the use of these materials in NASA's Genesis Discovery Mission will be discussed

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

REFERENCES

1. Yoder, Max N., in Synthetic Diamond: Emerging CVD Science and Technology, edited by Spear, Karl E. and Dismukes, John P. (John Wiley & Sons Publishers, New York, 1994) pp. 317 Google Scholar
2. http://genesismission.jpl.nasa.gov/Google Scholar
3. Mori, Y., Kawarada, H., and Hiraki, A., Appl. Phys. Lett. 58, 940 (1991)Google Scholar
4. Angus, J.C., Cassidy, W. D., Wang, L., Wang, Y., Evans, E., and Kovach, C.S., Mat. Res. Soc. Symp. Proc. Vol. 383 Materials Res. Soc., Pittsburgh, PA, pp. 4556 (1995)Google Scholar
5. Lampert, M., and Mark, P., Current Injection in Solids, Academic Press, New York, pp 7 (1970)Google Scholar
6. Moazed, K. L., Zeidler, J.R., and Taylor, M.J., J. Appl. Phys. 68 pp. 22462253 (1990)Google Scholar
7. Hill, R. M., Thin Solid Films, 1, pp. 3968 (1967)Google Scholar
8. Keblinski, P., Wolf, D., Cleri, F., Philipot, S.R., and Gleiter, H., MRS bulletin, pp. 36 (1998)Google Scholar
9. Pollock, Daniel D., Electrical Conduction in Solids: An introduction, American Society For Metals, Ohio, pp 193240 (1995)Google Scholar