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Amorphous Silicon Laser Quenched from the Melt - Preparation & Characterization

Published online by Cambridge University Press:  15 February 2011

A.G. Cullis
Affiliation:
Royal Signals and Radar Establishment, St. Andrews Road, Malvern, England
H.C. Webber
Affiliation:
Royal Signals and Radar Establishment, St. Andrews Road, Malvern, England
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Abstract

Short (2.5nsec) pulses of ultra-violet radiation from a Q-switched laser system have been used to induce a range of defect transitions in the surface regions of (001) and (111) Si single crystal by transient melting and resolidification. Relatively large areas of Si have been uniformly processed and this has enabled the measurement of thresholds for both amorphization and extended defect production. The highest quench rates (isotherm velocities of ∼20m/sec) were achieved at the surface melting threshold near 0.2J/cm2 and both (001) and (111) Si could be amorphized with radiation energy densities close to this value. With increasing energy density the quench rate fell and (001) Si ceased to amorphize before (111) Si. Furthermore, over a range of high radiation fluxes the crystalline Si produced on (111) surfaces was highly defective and contained twins due to errors in liquid-phase epitaxy. The various observed structure transitions have been related to the predictions of crystal growth theory with account taken of melt undercooling effects. The amorphous Si produced during this work (up to almost 1000Å thickness) has been shown to be structurally similar to that produced by conventional methods. Both direct analysis and solid-phase regrowth experiments have demonstrated that its impurity content is negligible.

Type
Research Article
Copyright
Copyright © Materials Research Society 1982

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References

REFERENCES

1. Celler, G. K., Poate, J. M. and Kimerling, L. C., Appl. Phys. Lett. 32, 464 (1978).CrossRefGoogle Scholar
2. Auston, D. H., Surko, C. M., Venkatesan, T. N. C., Slusher, R. E. and Golovchenko, J. A., Appl. Phys. Lett. 33, 437 (1978).Google Scholar
3. Baeri, P., Campisano, S. U., Foti, G. and Rimini, E., Phys. Rev. Lett. 41, 1246 (1978).Google Scholar
4. Stritzker, B., Pospieszczyk, A. and Tagle, J. A., Phys. Rev. Lett. 47, 356 (1981).Google Scholar
5. Cullis, A. G., Webber, H. C., Poate, J. M. and Simons, A. L., Appl. Phys. Lett. 36, 320 (1980).Google Scholar
6. White, C. W., Wilson, S. R., Appleton, B. R. and Young, F. W., J. Appl. Phys. 51, 738 (1980).Google Scholar
7. Poate, J. M., this proceedings volume.Google Scholar
8. Liu, P. L., Yen, R., Bloembergen, N. and Hodgson, R. T., Appl. Phys. Lett. 34, 864 (1979).Google Scholar
9. Tsu, R., Hodgson, R. T., Tan, T. Y. and Baglin, J. E., Phys. Rev. Lett. 42, 1356 (1979).Google Scholar
10. Baeri, P., this proceedings volume.Google Scholar
11. Cullis, A. G., Webber, H. C., Chew, N. G., Poate, J. M. and Baeri, P., Phys. Rev. Lett., in the press.Google Scholar
12. Cullis, A. G., Webber, H. C. and Bailey, P., J. Phys. E: Sci. Instrum. 12, 688 (1979).Google Scholar
13. Joy, D. C. and Maher, D. M., Ultramicroscopy 5, 333 (1980).Google Scholar
14. Liu, J. M., Yen, R., Donovan, E. P., Bloembergen, N. and Hodgson, R. T., Appl. Phys. Lett. 38, 617 (1981).Google Scholar
15. Gilmer, G. H. and Leamy, H. J. in: Laser and Electron Beam Processing of Materials, White, C. W. and Peercy, P. S. eds. (Academic Press, New York, 1980).Google Scholar
16. Jackson, K. A. in: Proceedings of NATO Institute on Surface Modification and Alloying (Trevi, 1981), Poate, J. M. and Foti, G. eds. in the press.Google Scholar
17. Baeri, P., Foti, G., Poate, J. M. and Cullis, A. G., Phys. Rev. Lett. 45, 2036 (1980).Google Scholar
18. Spaepen, F. and Turnbull, D. in: Laser-Solid Interactions and Laser Processing 1978, Ferris, S. D., Leamy, H. J. and Poate, J. M. eds. (Amer. Inst. Phys., New York, 1979) pp. 7378.Google Scholar
19. Bagley, B. G. and Chen, H. S. in Ref. 18, pp. 97–102.Google Scholar