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Analysis of composition changes across the Si/SiOx interface using fresnel fringe contrast analysis

Published online by Cambridge University Press:  22 February 2011

Frances M. Ross  and
W. M. Stobbs
Frances M. Ross
Affiliation:
University of Cambridge, Department of Materials Science and Metallurgy, Pembroke Street, Cambridge CB2 3QZ, U.K.
W. M. Stobbs
Affiliation:
University of Cambridge, Department of Materials Science and Metallurgy, Pembroke Street, Cambridge CB2 3QZ, U.K.
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Abstract

Fresnel fringe contrast analysis and high resolution electron microscopy are used in conjunction to measure compositional and structural changes across the Si/SiOx interface with atomic resolution.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 105: Symposium F – SiO2 and Its Interfaces , 1987 , 259
Copyright
Copyright © Materials Research Society 1988

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References

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