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Analysis of Dislocation Behavior in Low Dislocation Density, PVT-Grown, Four-Inch Silicon Carbide Single Crystals

Published online by Cambridge University Press:  01 February 2011

Michael Dudley ,
Shayan Byrappa ,
Huanhuan Wang ,
Fangzhen Wu ,
Yu Zhang ,
Balaji Raghothamachar ,
Gloria Choi ,
Edward Sanchez ,
Darren Hansen  and
Roman Drachev
...Show all authors
Michael Dudley
Affiliation:
mdudley@notes.cc.sunysb.edu, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Shayan Byrappa
Affiliation:
mb_shayan@yahoo.com, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Huanhuan Wang
Affiliation:
whh.mse@gmail.com, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Fangzhen Wu
Affiliation:
wfz1125@gmail.com, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Yu Zhang
Affiliation:
yuzhang0924@gmail.com, Stony Brook University, Materials Science and Engineering, Old Engineering Building, Room 311, Stony Brook, New York, 11790, United States, 6317421987
Balaji Raghothamachar
Affiliation:
braghoth@notes.cc.sunysb.edu, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Gloria Choi
Affiliation:
gloriachoi32@gmail.com, Stony Brook University, Materials Science and Engineering, Stony Brook, New York, United States
Edward Sanchez
Affiliation:
edward.sanchez@dowcorning.com, Dow Corning Compound Semiconductor Solutions, Midland, Michigan, United States
Darren Hansen
Affiliation:
daren.hansen@dowcorning.com, Dow Corning Compound Semiconductor Solutions, Midland, Michigan, United States
Roman Drachev
Affiliation:
rodrachev@dowconring.com, Dow Corning Compound Semiconductor Solutions, Midland, Michigan, United States
Mark Loboda
Affiliation:
mar.lob@dowconing.com, Dow Corning Compound Semiconductor Solutions, Midland, Michigan, United States
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Abstract

Synchrotron White Beam X-ray Topography studies are presented of dislocation behavior and interactions in a new generation of one hundred millimeter diameter, 4H-SiC wafers grown using Physical Vapor Transport (PVT) under specially designed low stress conditions. Such low stress growth conditions have, for example enabled reductions of basal plane dislocation (BPD) densities by two or three orders of magnitude compared to previous levels down to just a few hundred per square centimeter. This provides a unique opportunity to discern details of dislocation behavior which were previously precluded due to complications of image overlap at higher densities. Among the phenomena observed in these studies is the deflection of threading dislocations onto the basal plane producing various stacking fault configurations. Analysis of the contrast from these faults enables determination of their fault vectors which, in turn, provides insight into their possible formation mechanisms.

Keywords

crystal growthdefectsdislocations
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1246: Symposium B – Silicon Carbide 2010-Materials, Processing and Devices , 2010 , 1246-B02-02
Copyright
Copyright © Materials Research Society 2010

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