Hostname: page-component-76fb5796d-9pm4c Total loading time: 0 Render date: 2024-04-29T09:32:34.623Z Has data issue: false hasContentIssue false

Annealing Effect of Cd+ Ion-Implanted Liquid Encapsulated Czochralski-GaAs

Published online by Cambridge University Press:  21 February 2011

Y. Kawasumi
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305 Japan Science University of Tokyo, 1-3 Kagurazaka, Shinjuku, Tokyo 162, Japan
Y. Makita
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
S. Kimura
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
T. Iida
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
M. Kotani
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305 Science University of Tokyo, 2641 Yamazaki, Noda, Chiba 277-01, Japan
A. Obara
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
H. Shibata
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
N. Kobayashi
Affiliation:
Electrotechnical Laboratory, 1-1-4 Umezono, Tsukuba 305
T. Tsukamoto
Affiliation:
Japan Science University of Tokyo, 1-3 Kagurazaka, Shinjuku, Tokyo 162, Japan
E. Kobayashi
Affiliation:
Science University of Tokyo, 2641 Yamazaki, Noda, Chiba 277-01, Japan
Get access

Abstract

Furnace annealing (FA) and rapid thermal annealing (RTA) were made for Cd+ ion-implanted GaAs with Cd concentration, [Cd] from 1×1016cm−3 to 3×1021 cm−3. In FA samples, Raman scattering spectra exhibited a single peak at 292 cm−1 for entire [Cd] range which is LO-phonon mode from (100) GaAs. In RTA samples, LO-phonon mode is a single peak for [Cd]<1×1019cm−3 but with growing [Cd], TO-phonon mode appears for [Cd] 1×1020cm3 and becomes a dominant signal for [Cd]=3×1021 cm−3. The quenching of LO-phonon mode with increasing [Cd] was more clearly observed in RTA samples than in FA ones. Hall-effects results, however, showed that activation rate of RTA samples is 6–7 times larger than that of FA ones for [Cd] 1×1021 cm−3. 2K photoluminescence spectra revealed that in FA samples multiple shallow emissions associated with Cd are formed while in RTA ones the dominant emission is the band to Cd acceptor transition.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1 Shibata, H., Makita, Y., Mori, M., Nakayama, Y., Takahashi, T., Yamada, A., Mayer, K.M., Ohnishi, N., and Beye, A.C., Inst. Phys. conf. Ser 106, 245 (1989).Google Scholar
2 Takeuchi, Y., Makita, Y., Kudo, K., Nomura, T., Tanaka, H., Irie, K., and Ohnishi, N., Appl. Phys. Lett. 48, 59 (1986).Google Scholar
3 Makita, Y., Yamada, A., Shibata, H., Asakura, H., Ohnishi, N., Beye, A.C., Mayer, K.M., and Kutsuwada, N., Mat. Res. Soc. Symp. Proc. 163, 115 (1990). H. Shibata, A. Obara, S. Niki, S. Uekusa, and T. Tsukamoto, Mat. Res. Soc. Symp. Proc. 316, 1029(1994).Google Scholar
4 Shen, H.L., Makita, Y., Niki, S., Yamada, A., Iida, T., Shibata, H., Obara, A., and Uekusa, S., Appl. Phys. Lett. 63, 1780 (1993).Google Scholar
5 Iida, T., Makita, Y., Winter, S., Kimura, S., Tsai, Y., Kawasumi, Y., Fons, P., Yamada, A., (1985).Google Scholar
6 Pearton, S.J., Cummings, K.D., and Vella-Coleiro, G.P., J. Appl. Phys. 58, 3252.Google Scholar
7 Bensalem, R., and Sealy, B., Appl. Phys. Lett. 50, 1382 (1987).Google Scholar
8 Landolt - Bornstein, , Semiconductors; Physics of Group IV Elements and III-VCompound. HI/17a, P. 225.Google Scholar
9 Lindhard, J., Scharff, M., and Schiott, H.E., Mat. Fys. Medd. Dan. vid. Selsk. 33, 1 (1963).Google Scholar
10 Abstreiter, G., Bauser, E., Fischer, A., and Ploog, K., Appl. Phys. 16, 345 (1978).Google Scholar
11 Motooka, T., and Holland, H.W., Appl. Phys. Lett. 58, 2360 (1991).Google Scholar
12 Fukasawa, R., Wakaki, M., Ohta, K., and Okumura, H., Jpn. J. Appl. Phys. 25, 652 (1986).Google Scholar
13 Skolnick, M. S., 1986 Proc. 18th Int. Conf. on Physics of Semiconductors ed Engstrom, O. (World-Scientific, Sinapore, 1987)Google Scholar
14 Ohnishi, N., Makita, Y., Shibata, H., Beye, A.C., Yamada, A., and Mori, M., Mat. Res. Soc. Symp. Proc. 145, 493 (1989).Google Scholar
15 Nomura, T., Makita, Y., Irie, K., Ohnishi, N., Kudo, K., Tanaka, H., and Mitsuhashi, Y., Appl. Phys. Lett. 48, 1745 (1986).Google Scholar