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Application of XPS and Nuclear Technique to the Study of the Gel Layers Formed Under Different Redox Conditions on Leached Glasses

Published online by Cambridge University Press:  26 February 2011

A. Manara
Affiliation:
CEC, Joint Research Centre, Ispra Establishment
F. Lanza
Affiliation:
CEC, Joint Research Centre, Ispra Establishment
G. Ceccone
Affiliation:
CEC, Joint Research Centre, Ispra Establishment
G. Della Mea
Affiliation:
Padua University, Lagnaro Laboratories
G. Salvagno
Affiliation:
Padua University, Lagnaro Laboratories
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Abstract

Surface analysis has been conducted on samples leached in a Soxhlet apparatus at 100°C in presence and in absence of air. The XPS and RBS techniques were applied to analyse the content of the silicon, iron and uranium while the nuclear reaction method was utilized to analyse the hydrogen content. The anoxic environment favours the release of iron while decreasing the dissolution of uranium. Hydrogen content is always higher in samples leached in presence of air.

Silicon depletion is evident in all cases. The diffusion process seems to regulate the growth of the layer on the glass surface. After long leaching time a detachment, at least partial, of this layer is observed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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