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Applications of Beam-Solid Interactions in Semiconductor Material and Device Processing

Published online by Cambridge University Press:  25 February 2011

John C. C. Fan*
Affiliation:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts 02173-0073
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Abstract

Pulsed or scanned energy beams have been shown to be very useful for many semiconductor applications, ranging from annealing of ion-implanted damage to preparation of materials. An overview of this important field is given and its prospects assessed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

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