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Applications of the Xia Scanning Photoemission Spectromicroscope for Element Identification on Material Surfaces

Published online by Cambridge University Press:  15 February 2011

Cheng-Hao Ko ,
Janos Kirz ,
Harald Ade ,
Steve Hulbert ,
Erik Johnson  and
Erik Anderson
Cheng-Hao Ko
Affiliation:
Department of Physics, SUNY@Stony Brook, Stony Brook, NY 11794
Janos Kirz
Affiliation:
Department of Physics, SUNY@Stony Brook, Stony Brook, NY 11794
Harald Ade
Affiliation:
Department of Physics, NCSU, Raleigh NC 27695
Steve Hulbert
Affiliation:
National Synchrotron Light Source, Brookhaven National Laboratory, Upton NY 11973
Erik Johnson
Affiliation:
National Synchrotron Light Source, Brookhaven National Laboratory, Upton NY 11973
Erik Anderson
Affiliation:
Center for X-ray Optics, Lawrence Berkeley Laboratory, Berkeley CA 94720
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Abstract

The Second Generation Scanning Photoemission Microscope at the beamline X1A of the National Synchrotron Light Source (NSLS), X1A SPEM II, is designed for spatially resolved elemental and chemical analysis by X-ray Photoelectron Spectroscopy (XPS) on material surfaces. Based on Fresnel Zone Plate (ZP) microfocusing techniques with the use of a bright and coherent photon source, this microscope is capable of acquiring XPS spectra from a small area irradiated by the focused beam and taking element-specific (using photopeaks) or chemical-state-specific (by detecting the chemical core level shifts) images with a spatial resolution defined by the focused spot size.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 375: Symposia AA – Applications of Synchrotron Radiation Techniques to Materials Science , 1994 , 303
Copyright
Copyright © Materials Research Society 1995

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References

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