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Atom Probe Analysis of Native Oxides and the Thermal Oxide/Silicon Interface.

Published online by Cambridge University Press:  26 February 2011

C. R. M. Grovenora ,
A. Cerezo  and
G. D. W. Smith
C. R. M. Grovenora
Affiliation:
Department of Metallurqy and Science of Materials,Parks Road,OXFORD,UK.
A. Cerezo
Affiliation:
Department of Metallurqy and Science of Materials,Parks Road,OXFORD,UK.
G. D. W. Smith
Affiliation:
Department of Metallurqy and Science of Materials,Parks Road,OXFORD,UK.
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Abstract

The Pulsed Laser Atom Probe has been used to determine for the first time the stoichiometry of both the native oxide on Si and of the SiO2/Si interface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 37: Symposium D – Layered Structures, Epitaxy, and Interfaces , 1984 , 199
Copyright
Copyright © Materials Research Society 1985

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