Hostname: page-component-848d4c4894-nr4z6 Total loading time: 0 Render date: 2024-05-09T12:40:35.591Z Has data issue: false hasContentIssue false

Characterization of Deep Level Defects in 4h and 6H SIC Via DLTS, SIMS And MEV E-Beam Irradiation

Published online by Cambridge University Press:  15 February 2011

J. P. Doyle
Affiliation:
Royal Institute of Technology, Solid State Electronics Electrum 229, S-164 40, Kista-Stockholm, Sweden
M. O. Aboelfotoh
Affiliation:
Royal Institute of Technology, Solid State Electronics Electrum 229, S-164 40, Kista-Stockholm, Sweden
M. K. Linnarsson
Affiliation:
Royal Institute of Technology, Solid State Electronics Electrum 229, S-164 40, Kista-Stockholm, Sweden
B. G. Svensson
Affiliation:
Royal Institute of Technology, Solid State Electronics Electrum 229, S-164 40, Kista-Stockholm, Sweden
A. Schöner
Affiliation:
Industrial Microelectronics Center P.O. Box 1084, S-164 21, Kista-Stockholm, Sweden
N. Nordell
Affiliation:
Industrial Microelectronics Center P.O. Box 1084, S-164 21, Kista-Stockholm, Sweden
C. Harris
Affiliation:
Industrial Microelectronics Center P.O. Box 1084, S-164 21, Kista-Stockholm, Sweden
J. L. Lindström
Affiliation:
National Defense Research Institute P.O. Box 1165, S-581 11 Linköping, Sweden
E. Janzén
Affiliation:
Department of Physics and Measurement Technology Linköping University, S-581 83 Linkoping, Sweden
C. Hemrnmingsson
Affiliation:
Department of Physics and Measurement Technology Linköping University, S-581 83 Linkoping, Sweden
Get access

Abstract

Electrically active defects in both 4H and 6H polytypes of SiC have been observed through the use of deep level transient spectroscopy (DLTS). Schottky contacts were grown by vapor phase epitaxy (VPE) with doping concentrations, the epitaxial layer having a doping concentration in the range of 1014 cm−3 to 1017cm−3. Numerous levels have been found in the as-grown n-type 6H-SiC samples and secondary ion mass spectrometry (SIMS) and MeV electron irradiation have been employed to corrrelate the defect levels to impurities or structural defects. In contrast, only a single level is observed in the as-grown 4H-SiC samples.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Pensl, G. and Choyke, W.J., Physica B, 185, 264, (1993)Google Scholar
2. Choyke, W.J. and Patrick, L., in Silicon Carbide 1973, (University of South Carolina Press, Columbia, 1974)Google Scholar
3. Patrick, L. and Choyke, W.J., Phys. Rev. B 10, 5091, (1974)Google Scholar
4. Lee, K.M., Dang, L.S., Watkins, G.D., and Choyke, C.J., Phys. Rev. B, 32 (4), 2273, (1985)Google Scholar
5. Vainer, V.S., II'in, V.A., Karachinov, V.A., and Tairov, Y.M., Sov. Phys. Solid State, 28(2), 201, (1986)Google Scholar
6. Maier, K., Muller, H.D., and Schneider, J., Mat. Sci. Forum, 8387, 1183, (1992)Google Scholar
7. Pensl, G. and Helbig, R., Festkorperprobleme 30 (1990)Google Scholar
8. Zhang, H., PhD. Thesis (1990), Erlangen University, Germany Google Scholar
9. Saddow, S.E., Lang, M., Dalibor, T., Pensl, G., and Neudeck, P.G., Appl. Phys. Lett., 66(26), 3612, (1995)Google Scholar
10. Nordell, N., Andersson, S.G., and Schoner, A., International Conference on SiC and Related Materials, Kyoto, Japan, (1995)Google Scholar