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Chromium Underlayer Effects in Longitudinal Magnetic Recording

Published online by Cambridge University Press:  15 February 2011

M. F. Doerner ,
P.-W. Wang ,
S. M. Mirzarnaani  and
D. S. Parker
M. F. Doerner
Affiliation:
IBM Storage Systems Products Division, 5600 Cottle Rd., San Jose, CA 95193 A. C. Wall, IBM Storage Systems Products Division, Rochester, MN 55901
P.-W. Wang
Affiliation:
IBM Storage Systems Products Division, 5600 Cottle Rd., San Jose, CA 95193 A. C. Wall, IBM Storage Systems Products Division, Rochester, MN 55901
S. M. Mirzarnaani
Affiliation:
IBM Storage Systems Products Division, 5600 Cottle Rd., San Jose, CA 95193 A. C. Wall, IBM Storage Systems Products Division, Rochester, MN 55901
D. S. Parker
Affiliation:
IBM Storage Systems Products Division, 5600 Cottle Rd., San Jose, CA 95193 A. C. Wall, IBM Storage Systems Products Division, Rochester, MN 55901
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Abstract

For media used in longitudinal recording, an epitaxial relationship is observed between the Cr and Co-alloy layers, and generally a strong Cr <100> texture is desirable for c-axis in-plane orientation of the Co alloy. In this study, Cr underlayer thickness, temperature and Cr deposition pressure were varied while keeping the magnetic layer (CoPtCr) deposition process constant. Films were deposited on circumferentially textured NiP, polished NiP and chemically elched NiP substrates as well as Si wafers in order to study the effects of surface finish on the crystallographic orientation of the Cr underlayer. The uniformity of the magnetic properties and in-plane anisotropy (orientation ratio) of the disks were measured using Kerr magnetrometry. The in-plane anisotropy was found to be related to the Cr deposition conditions and the surface texture of the NiP. Signal to noise ratio results and a possible mechanism for the origin of the in-plane anisotropy are discussed.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 232: Symposium T – Magnetic Materials: Microstructure and Properties , 1991 , 27
Copyright
Copyright © Materials Research Society 1991

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References

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