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Compliant Substrate Processes

Published online by Cambridge University Press:  10 February 2011

W. A. Doolittle  and
A. S. Brown
W. A. Doolittle
Affiliation:
Georgia Institute of Technology, School of Electrical and Computer Eng., Atlanta, GA 30332-0250, Email: alan.doolittle@ece.gatech.edu
A. S. Brown
Affiliation:
Georgia Institute of Technology, School of Electrical and Computer Eng., Atlanta, GA 30332-0250
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Abstract

Recent results indicate that compliant substrates offer significant promise as a new approach for strain management in semiconductors. The potential applications include 1) the growth of device-quality highly mismatched materials on dissimilar substrates, and 2) the lateral control of material properties resulting from the effects of strain on bandstructure and/or growth dynamics. A significant amount of research in this area is dedicated to the reduction of extrinsic processing effects resulting from compliant substrate fabrication, and the development of simple models for understanding the observed reduction in defect density and/or strain in the epitaxial films grown on compliant substrates. A recent focus in our work has been on the growth of GaN on a novel and easily removable substrate -lithium gallate- for the regrowth on a bonded GaN template. The first step in this approach is the optimization of the growth of GaN on lithium gallate. In addition, this approach requires the use of an appropriate bonding layer to reduce the strain or defect production during growth due to coefficient of thermal expansion mismatches between the GaN sample and the handle wafer. Our work in this area will be highlighted in the context of an overview of various compliant substrate approaches and current results that indicate their efficacy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 570: Symposium V – Epitaxial Growth , 1999 , 225
Copyright
Copyright © Materials Research Society 1999

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