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Controlling Area-Selective Atomic Layer Deposition of HfO2 Dielectric by Self-assembled Monolayers

  • Rong Chen (a1), Hyoungsub Kim (a2), Paul C. McIntyre (a2) and Stacey F. Bent (a3)

A series of self-assembled molecules have been investigated as deactivating agents for the HfO2 atomic layer deposition (ALD). Three important factors of self-assembled monolayers (SAMs) deactivating efficiency towards ALD--chain length, reactivity and steric effect--have been investigated and discussed as well as the initial blocking mechanism of this process. This investigation shows that in order to achieve satisfactory deactivation, it is crucial to choose high reactivity, low steric effect molecules with certain chain length to form condensed, high hydrophobic organic monolayers.

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  • ISSN: -
  • EISSN: 1946-4274
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