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Crystallization Behavior of Sputter Deposited Amorphous NixZr100-x, Films

Published online by Cambridge University Press:  26 February 2011

Gillian E. Winters ,
K.M. Unruh  and
C.P. Swann
Gillian E. Winters
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, DE 19716
K.M. Unruh
Affiliation:
Department of Physics and Astronomy, University of Delaware, Newark, DE 19716
C.P. Swann
Affiliation:
Department of Physics and Astronomy/Bartol Research Institute, University of Delaware, Newark, DE 19716
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Abstract

Sputter deposited films of amorphous NixZr100-x, have been prepared over a wide and continuous range of compositions between x=20 and x=90 atomic percent Ni on liquid nitrogen cooled and room temperature substrates. These films have been characterized by xray and electron diffraction, transmission electron microscopy, and Rutherford backscattering spectrometry. The crystallization behavior of these films has been systematically studied by differential scanning calorimetry and compared with earlier measurements on amorphous liquid quenched alloys. Systematic differences were found between the thermal stability of amorphous alloys of the same nominal composition prepared at different substrate temperatures. Larger differences exist between vapor deposited amorphous films and liquid quenched ribbons.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 205: Symposium F – Kinetics of Phase Transformations , 1990 , 221
Copyright
Copyright © Materials Research Society 1992

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