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Cu Induced Optical Transitions in MOCVD Grown Cu Doped GaN

Published online by Cambridge University Press:  01 February 2011

Jayantha Senawiratne
Affiliation:
jsenawiratne1@student.gsu.edu
Martin Strassburg
Affiliation:
mstrassb@ece.gatech.edu
Adam Payne
Affiliation:
ampayne@ece.gatech.edu
Ali Asghar
Affiliation:
asghar@ece.gatech.edu
William Fenwick
Affiliation:
fenwick@ece.gatech.edu
Nola Li
Affiliation:
nola@ece.gatech.edu
Ian Ferguson
Affiliation:
ianf@ece.gatech.edu
Nikolaus Dietz
Affiliation:
ndietz@gsu.edu
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Abstract

Optical and structural properties of in situ Cu doped GaN thin films grown on sapphire substrates were optically investigated by means of Raman, photoluminescence (PL), and absorption spectroscopy. Different Cu concentrations in the films were analyzed by secondary ion mass spectroscopy (SIMS) and found to vary from 2×1016 cm-3 to 5×1017 cm-3. Raman studies confirmed high crystalline quality of GaN:Cu with no major structural damages due to Cu incorporation. PL investigation revealed that the origin of the emission around 2.4 eV is most likely due to Cu incorporation. The electrical conductivity of the samples was analyzed by Hall measurements and the found semi-insulating behavior was assigned to the compensation of intrinsic donors by the deep Cu acceptor states.

Keywords

Type
Research Article
Copyright
Copyright © Materials Research Society 2006

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References

REFERENCES

1 Senawiratne, J., Strassburg, M., Payne, A. M., Asghar, A., Fenwick, W. E., Li, N., Wagner, M., Hoffmann, A., Dietz, N., and Ferguson, I. T., submitted to Phys. Stat. Sol. (c) (2005).Google Scholar
2 Feng, Z.C., Payne, A.M., Nicol, D., Helm, P.D., Ferguson, I.. Senawiratne, J., Strassburg, M., Dietz, N., Hums, Ch. and Hoffman, A., in “GaN and related alloys 2003”, ed, Ng, H.M.. Wraback, M., Hiramatsu, K., Grandjean, N.; Mat. Res. Soc. Symp. Proc. 798, pp. 545550 (2004).Google Scholar
3 Limmer, W., Ritter, W., Sauer, R., Mensching, B., Liu, C., and Rauschenbach, B., Appl. Phys. Lett 72, 2589, (1998).CrossRefGoogle Scholar
4 Boudart, B., Guhel, Y., Pesant, J. C., Dhamelincourt, P., and Poisson, M.A., J. Phys.: Condens. Matter 16, 49 (2004).Google Scholar
5 Arguello, C.A., Rousseau, D. L., and Porto, S.P.S., Phys. Rev. 181, 1351 (1969).CrossRefGoogle Scholar
6 Popovici, G., Xu, G. Y., Botchkarev, A., Kim, W., Tang, H., Salvador, A., Morkoc, M., Strange, R., and White, J. O., J. Appl. Phys. 82, 4020 (1997).CrossRefGoogle Scholar
7 Ashcroft, N. W., Mermin, N. D.: Solid State Physics (Holt, Rinehart and Winston, New York 1976).Google Scholar
8 Manchon, D.D., Barker, A. S., Dean, P. J., Zetterstrom, R. B.: Solid State Commun. 8, 1227 (1970).CrossRefGoogle Scholar
9 Azuhata, T., Sota, T., Suzuki, K., Nakamura, S.: J. Phys.: Condens. Matter 7, L129 (1995).Google Scholar
10 Monteiro, T., Boemare, C., Soares, M. J., Alves, E., and Lie, C., Physica B, 308–310, 42 (2001).CrossRefGoogle Scholar
11 Korotkov, R. K., Gregie, J. M., and Wesseles, B. W., Amter. Res. Soc. Symp. Proc. 639, G6.39 (2001).CrossRefGoogle Scholar
12 Neugebauer, J., and Van de Walle, C. G., Appl. Phys. Lett. 69, 503 (1996).CrossRefGoogle Scholar
13 Nakamura, S. and Fosol, G., The Blue Laser Diode (Springer, Berlin, 1998).Google Scholar
14 Sheu, J. K., Su, Y. K., Chi, G. C., Pong, B. J., Chen, C. Y., Huang, C. N., and Chen, W. C., J. Appl. Phys. 84, 4590 (1998).CrossRefGoogle Scholar
15 Bayer, M. W. et al. ., Appl. Phys. Lett. 74, 3281 (1999).Google Scholar
16 Bozdog, C., Chow, K. H., Watkins, G. D., Sunakawa, H., Kuroda, N., and Usai, A., Phys. Rev. B 62, 12923, (2000).CrossRefGoogle Scholar
17 Kaschner, A., Siegle, H., Kaczmarczyk, G., Strasbug, M., Hoffmann, A., Thomsen, C., Birkle, U., Einfeldt, S., and Hommel, D., Appl. Phys. Lett. 74, 94720, (1999).Google Scholar
18 Nakamura, I., Iwasa, N., Senoh, M., and Mukai, Jpn. J. Appl. Phys., Part 1 31, 1258 (1992).CrossRefGoogle Scholar