In this work, a determination of the surface energy for hydrogen terminated nanocrystalline diamond grown with microwave plasma enhanced chemical vapor deposition is presented. Five identical hydrogen terminated nanocrystalline diamond layers of ~150 nm thick are deposited on silicon substrates and examined with X-ray photoelectron spectroscopy to determine the surface groups and possible surface contaminations. In order to evaluate the surface energy, contact angle measurements are performed using the sessile drop method in combination with data analysis based on the ‘Owens, Wendt, Rabel and Kaelble’ method. Four different experimental approaches to evaluate the surface energy of hydrogen terminated nanocrystalline diamond are discussed.
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