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Effects of Process Parameters on the Adhesion of Copper Film on Polyethylene Tetrephthalate(Pet) Substrate Prepared by ECRMOCVD Coupled with a Periodic DC Bias

Published online by Cambridge University Press:  01 February 2011

Jin Hyun
Affiliation:
Eco-Nano Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongyang Seoul 130–650, Korea
Bup Ju Jeon
Affiliation:
Dept. of Materials Science & Engineering, Korea University, Seoul, 136–701, Korea
Dongjin Byun
Affiliation:
Eco-Nano Research Center, Korea Institute of Science and Technology, P.O. Box 131, Cheongyang Seoul 130–650, Korea
Joong Kee Lee
Affiliation:
Dept. of Materials Science & Engineering, Korea University, Seoul, 136–701, Korea
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Abstract

Characteristics of Cu/C:H films on the PET substrate prepared by ECR-MOCVD coupled with a DC bias under Cu(hfac)2-Ar-H2 was investigated with special attention to process parameters. Our results showed that the Cu/C:H film has strongly adhere with the polymer substrate by chemical bonding and exhibited wide range of electrical conductivity that could be controlled by process parameters. The increase in H2/Ar ratio, microwave power and negative DC bias voltage brought on the higher pulling strength between Cu/C:H films and PET substrate. The effects of surface pretreatments of polymer substrate on pulling strength were insignificant in the range of our experimental range.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

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References

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