Hostname: page-component-54dcc4c588-wlffp Total loading time: 0 Render date: 2025-09-19T04:44:38.319Z Has data issue: false hasContentIssue false
  • English
  • Français

Elastic Properties of Sputtered Thin Films: Influence of Different Preparation Conditions

Published online by Cambridge University Press:  15 February 2011

C.E. Bottani ,
M. Elena ,
M. Beghi ,
G. Ghislotti ,
L. Guzman ,
A. Miotello  and
P.M. Ossi
C.E. Bottani
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
M. Elena
Affiliation:
Istituto per la Ricerca Scientifica e Tecnologica, 38050 Povo, Italy
M. Beghi
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
G. Ghislotti
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy
L. Guzman
Affiliation:
Dipartimento di Fisica dell'Università, 38050 Povo (TN), Italy
A. Miotello
Affiliation:
Dipartimento di Fisica dell'Università, 38050 Povo (TN), Italy
P.M. Ossi
Affiliation:
Dip. Ingegneria Nucleate, Politecnico, via Ponzio 34/3, 20133 Milano, Italy Unità clNFM, 38050 Povo (TN), Italy.
Get access

Abstract

This work presents the first results of a study aimed at better understanding the elastic behaviour of hard coatings produced by various techniques. This is important also in view of the need to be able to control the level of internal stresses, particularly in PVD coatings. It is well known that in extreme cases excessive internal stress can lead to complete film destruction. We devote this paper to reactively magnetron sputtered TiN, one of the most widely used compounds. Thin TiN films of different compositions were deposited on Si substrates and characterized by SEM, AES, XRD and Brillouin light scattering.

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 308: Symposium M1 – Thin Films: Stresses and Mechanical Properties IV , 1993 , 95
Copyright
Copyright © Materials Research Society 1993

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

Article purchase

Temporarily unavailable

References

REFERENCES

1 Marchetti, F., Dapor, M., Girardi, S., Giacomozzi, F., and Cavalleri, A., Mater. Sci. Engin., A115 (1989) 217.CrossRefGoogle Scholar
2 Sundgren, J.E., Johansson, B.O., and Karlsson, S.E., Surface Sci., 128 (1983) 265.Google Scholar
3 Dawson, P.T., and Tzatzov, K.K., Surface Sci., 149 (1985) 105.Google Scholar
4 Panjan, P., Navinsek, B., Zabkar, A., Fiser, J., and Zalar, A., Vacuum, 40 (1990) 81.CrossRefGoogle Scholar
5 Sandercock, J.R., Light scattering in solids III, edited by Cardona, M. and Guntherod, G., Springer Verlag, Berlin 1982, p. 173.Google Scholar
6 Nizzoli, and Mills, D.L., Nonlinear surface electromagnetic phenomena, North Holland, Amsterdam, 1991, p. 445.Google Scholar
7 Loudon, R.: Phys. Rev. Letters, 40 (978) 581.Google Scholar
8 Farnell, G.W. and Adler, E.L., Physical acoustic IX, edited by Mason, W.P. and Thurston, R.N., editors, Academic press, NY 1972, p. 35.Google Scholar
9 Sandercock, J.R.: J.Phys.E, 9, 566 (1976).Google Scholar
10 Presented at ICMCTF93. To be published.Google Scholar
11 Joint Committee on Powder Diffraction Standards (JCPDS) cards, publ. by Intern. Center for Diffraction Data, Swarthmore, PA, USA, 1990, card number 38-1420.Google Scholar
12 Hayes, W., Loudon, R., Scattering of light by crystals, John Wiley, NY, 1978.Google Scholar
13 Jiang, X., Wang, M., Shmidt, K., Dunlop, E., Haupt, J., Gissler, W.: J.Appl.Phys., 69 (1191)3053.Google Scholar