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Electrical Stabilization of Diamond Mis Interface and Misfets by Ultrahigh-Vacuum Process

  • Young Yun (a1), Tetsuro Maki (a1), Hiroyuki Tanaka (a1) and Takeshi Kobayashi (a1)

In order to obtain electrically stabilized MIS interface, a diamond metal-insulator- semiconductor field-effect transistor (MISFET) was prepared by means of reduced-oxygen process including ultrahigh-vacuum (UHV) process, and its electrical properties were closely investigated. According to the results, observed effective mobility (μeff) was 400 cm2/Vs at room temperature, which is the highest value obtained until now in the diamond FET at room temperature. The transconductance (gm) and surface state density (Nss) of the device operation region was 5mS/mm and ∼ 1010/cm2 eV, respectively, which is also comparable with conventional Si MOSFETs with the same gate length (Lg = 30μm).

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  • EISSN: 1946-4274
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