Hostname: page-component-848d4c4894-nr4z6 Total loading time: 0 Render date: 2024-05-16T05:48:12.414Z Has data issue: false hasContentIssue false
  • English
  • Français

The Enhanced Magnetization Observed in FE/mo Multilayers Deposited by Ion-Beam Sputtering

Published online by Cambridge University Press:  26 February 2011

Y. Wang ,
F.Z. Cui ,
W.Z. Li  and
Y.D. Fan
Y. Wang
Affiliation:
Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
F.Z. Cui
Affiliation:
Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
W.Z. Li
Affiliation:
Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
Y.D. Fan
Affiliation:
Department of Materials Science and Engineering, Tsinghua University, Beijing 100084, China
Get access

Abstract

Fe/Mo multilayers, with varied Fe single layer thickness, tF, and Mo single layer thickness, tMO, were deposited by using a focusing ion-beam sputtering technique. Their structural and magnetic properties were studied. The periodic modulated structure was observed for all samples. An enhancement of magnetization over the value of bulk Fe was noticed for some samples. The change of lattice spacing of Fe layers, as a result of compress stress in the film plane, was considered to be responsible for the increase of the magnetization for Fe/Mo multilayers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 231: Symposium S – Magnetic Surfaces, Thin Films and Multilayers , 1991 , 417
Copyright
Copyright © Materials Research Society 1992

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Stearns, M.B., Lee, C.H., and Groy, T.L., Phys. Rev. B 40, 8256 (1989).Google Scholar
2. Cui, F.Z., Fan, Y.D., Wang, Y., Vredenberg, A.M., Draaisma, H.J.D., and Xu, R., J. Appl. Phys. 68, 701 (1990).Google Scholar
3. Broeder, F.J.A. den, Donfersloot, H.C., Draaisma, H.J.G., and Jonge, W.J.M. de, J. Appl. Phys. 63, 3479 (1988).Google Scholar
4. Sato, B., J. Appl. Phys. 67, 4462 (1990).Google Scholar
5. Krishnan, R., and Tessier, M., J. Appl. Phys. 67, 5391 (1990).Google Scholar
6. Freeman, A.J., and Fu, C.L., J. Appl. Phys. 61, 3356 (1987).Google Scholar
7. Wang, Y., Cui, F.Z., Li, W.Z. and Fan, Y.D., in Thin Films and Beam-Solid Interaction, edited by Li, H.D. (Elsevier Science Publishers B.V. 1991) pp. 119–122.Google Scholar
8. Windows, B., and Sharples, F., J. Mater. Res. 3, 856 (1988).Google Scholar
9. Thornton, J.A., J. Vac. Technol. A4, 3059 (1986).CrossRefGoogle Scholar
10. Andersen, O.K., Madsen, J., Poulsen, U.K., Jepsen, O., and Kollar, J., Physica 86–88B, 249 (1977).Google Scholar
11. Moruzzi, L., Schwarz, P.M., and Mohn, P., Phys. Rev. B 34,1784 (1986).CrossRefGoogle Scholar