Hostname: page-component-8448b6f56d-gtxcr Total loading time: 0 Render date: 2024-04-25T00:56:21.522Z Has data issue: false hasContentIssue false

Experimental Analysis and a New Theoretical Model for Anomalously High Ideality Factors (n ≫ 2.0) in GaN-based p-n Junction Diodes

Published online by Cambridge University Press:  01 February 2011

Jay M. Shah
Affiliation:
Electrical, Computer, and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12180–3590, U.S.A.
Yunli Li
Affiliation:
Electrical, Computer, and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12180–3590, U.S.A.
Thomas Gessmann
Affiliation:
Electrical, Computer, and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12180–3590, U.S.A.
E. Fred Schubert
Affiliation:
Electrical, Computer, and Systems Engineering Department, Rensselaer Polytechnic Institute, Troy, NY 12180–3590, U.S.A.
Get access

Abstract

Diode ideality factors of 2.0–8.0 have been reported in GaN-based p-n junctions. These values are much higher than the expected values of 1.0–2.0 as per the Sah-Noyce-Shockley theory. We propose a fundamentally new model for the high ideality factors obtained in GaN-based diodes. This model is based on the effect of moderately doped unipolar heterojunctions as well as metal–semiconductor junctions in series with the p-n junction. A relation for the effective ideality factor of a system of junctions is developed. A detailed experimental study is performed on diodes fabricated from two different structures, a bulk GaN p-n junction structure and a p-n junction structure incorporating a p-type AlGaN/GaN superlattice. Bulk GaN p-n junction diode displays an ideality factor of 6.9, whereas the one with the superlattice structure displays an ideality factor of 4.0. In addition, device simulation results further strengthen the model by showing that moderately doped unipolar heterojunctions are rectifying and increase the effective ideality factor of a p-n junction structure.

Type
Research Article
Copyright
Copyright © Materials Research Society 2004

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Sah, C., Noyce, R. N. and Shockley, W., Proc. IRE 45, 1228 (1957).Google Scholar
2. Dmitriev, V. A., MRS Internet J. Nitride Semicond. Res. 1, 29 (1996).Google Scholar
3. Casey, H. C. Jr, Muth, J., Krishnankutty, S., and Zavada, J. M., Appl. Phys. Lett. 68, 2867 (1996).Google Scholar
4. Perlin, P., Osinski, M., Eliseev, P. G., Smagley, V. A., Mu, J., Banas, M., and Sartori, P., Appl. Phys. Lett. 69, 1680 (1996).Google Scholar
5. Capasso, F. and Margaritondo, G., “Heterojunction band discontinuities: physics and device applications” (North-Holland, Netherlands, 1987).Google Scholar
6. Chandra, A. and Eastman, L. F., Electron. Lett. 15, 90 (1979).Google Scholar
7. Forrest, S. R. and Kim, O. K., J. Appl. Phys. 52, 5838 (1981).Google Scholar
8. Waldron, E. L., Li, Y.-L., Schubert, E. F., Graff, J. W., and Sheu, J. K., Appl. Phys. Lett. 83, 4975 (2003).Google Scholar
9. Rhoderick, E. H. and Williams, R. H., “Metal–Semiconductor Contacts”, Second Edition, (Oxford University Press, Oxford, 1988) pp. 129.Google Scholar
10. Li, Y.-L., Schubert, E. F., Graff, J. W., Osinsky, A., Schaff, W. F., Appl. Phys. Lett. 76, 2728 (2000).Google Scholar
11. Gessmann, T., Li, Y.-L., Waldron, E. L., Graff, J. W., Schubert, E. F., and Sheu, J. K., Appl. Phys. Lett. 80, 986 (2002).Google Scholar