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Fast Dosimeter Film For Evaluation Of X-Ray Lithography Sources

Published online by Cambridge University Press:  15 February 2011

Juan R. Maldonado
Affiliation:
IBM FSC Manassas, VA Mailing Address: IBM TPO, Rt. 52, Zip 399, Hopewell Jct., N.Y. 12533
Andrew Pomerene
Affiliation:
IBM T.J. Watson Research Center Yorktown Heights, N.Y.. 110598
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Abstract

This paper presents data on the soft x-ray behavior of the photochromic dosimeter film UVSC manufactured by Sensor Physics. In particular, the x-ray sensitivity measured with synchrotron storage ring x-ray sources will be presented and compared with a presently used dosimeter film which is many times less sensitive. Relevant properties of the film for x-ray source evaluation also will be presented together with data obtained with other x-ray lithography sources.

Type
Research Article
Copyright
Copyright © Materials Research Society 1993

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References

1. Sensor Physics, 491 Seaport Court #101, Redwood City, CA 94063Google Scholar
2. Shaw, J.M.,. and Hatzakis, M., IBM RC 8892 (#39013) 6/23/81.Google Scholar
3. Maldonado, J.R., Reisman, A., Lezec, H., Bumble, H., Williams, C.K., and Iyer, S.S., J. Vac Sci. Technol., B, Vol.5, No. 1, 248252, (Jan/Feb 1987)Google Scholar
4. Maldonado, J.R., Babich, I., Hsia, L.C., Rippstein., R. Flamholz, A. and DiMilia, V., Microelectronic Engineering 21 (1993) 113116 Google Scholar
5. Maldonado, J.R., to be published.Google Scholar
6. GAF Chemicals Corporation, 1361 Alps Road, Wayne, NJ 07470 201-628-3000Google Scholar