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Formation of AlxGa1-xAs Alloy on the Semi-Insulating GaAs Substrate by Laser Bean Interaction

Published online by Cambridge University Press:  26 February 2011

N. V. Joshi
Affiliation:
Honeywell Physical Sciences Center, 10701 Lyndale Avenue South, Bloomington, MN 55420
J. Lehman
Affiliation:
Honeywell Physical Sciences Center, 10701 Lyndale Avenue South, Bloomington, MN 55420
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Abstract

AlxGal-xAs alloy was obtained on semi-insulating GaAs by laser beam interaction. For this purpose, thin layers (~150 A) of AlAs and GaAs were deposited by MICVD on the semi-insulating undoped GaAs substrate and irradiated with a high power laser beam. For a certain critical value of incident power (7.1 watts/mm2), a layer of AlxGal-xAs alloy was formed. The nature of the alloy was examined by Auger and Far infrared reflectance spectroscopy. The later technique reveals the characteristic mode of AlxGal-xAs confirming its formation. Disorder induced LA mode was also observed.

Type
Research Article
Copyright
Copyright © Materials Research Society 1985

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References

REFERENCES

1) Kresel, H. and Butter, J.K., “Semiconductor Lasers and Heterojunction LEDS,” Academic Press, New York (1977).Google Scholar
2) Casey, H.C. Jr and Panish, M.B., “Heterostructure Lasers,” Academic Press, New York (1978).Google Scholar
3) Olshansky, R., Su, C.B., Manning, J., and Powazinik, W., IEE Journal of Quantum Electronics QE2=, No. 8, 838 (1984).Google Scholar
4) Tamura, M., Natsuaki, N., Miyao, M., Ohkura, M., Murai, F., Takeda, E., Minagawa, S., and Tokuyama, T., “Laser and Electron Beam Interactions with Solids,” Eds. Appleton, B.R. and Celler, G.K., [Elsevier Science Publishing Company, New York (1982)], p. 567.Google Scholar
5) Chang, I.F. and Mitra, S.S., Adv. in Phys. 2, 359 (1971).Google Scholar
6) Barker, A.S. and Sievers, A.J., Rev. of Modern Phys. A7, 52 (1975) and references therein.Google Scholar
7) Jusserand, B. and Sapriel, J., Phys. Rev. B, 24, 7194 (1981).Google Scholar
8) Durschlag, M.S. and DeTlemple, T.A., Solid State Comunuication, A4, p. 307 (1981).Google Scholar
9) Kim, O.K. and Spitzer, W.G., J. Appl. Phys. 5Q, 4362 (1979).Google Scholar
10) Saiut-Cricq, N., Carles, R., Renucci, J.B., Zwick, A., and Renucci, M.A., Solid State Comm., 39, 1137 (1981).CrossRefGoogle Scholar
11) Waugh, J.L.T. and Dolling, G., Phys. Rev. BT, 3481 (1973).Google Scholar
12) Talwar, D.N., Vandevyver, M., and Zigone, M., Phy. Rev. B, 2a, 1743 (1981).CrossRefGoogle Scholar