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Formation of Nanometer-Scale Dot Arrays from Diblock Copolymer Templates

Published online by Cambridge University Press:  01 February 2011

C. T. Black ,
K. W. Guarini ,
R. L. Sandstrom ,
S. Yeung  and
Y. Zhang
C. T. Black
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
K. W. Guarini
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
R. L. Sandstrom
Affiliation:
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
S. Yeung
Affiliation:
present address: University of California, Berkeley, CA 94720.
Y. Zhang
Affiliation:
present address: University of California, Berkeley, CA 94720.
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Abstract

We have developed four different fabrication processes based on self-organizing diblock copolymers that all produce densely-spaced, uniformly-sized nanometer-scale dot arrays over large wafer areas. We demonstrate the versatility of these techniques through examples of dot arrays formed of metallic, insulating, and polymeric materials. These fabrication processes vary in complexity, utility, and degree of optimization, and we discuss the relative merits of each. The ability to create uniform nanoscale features below lithographic resolution limits may enable key applications in fields such as magnetic recording and microelectronics.

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