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Fracture Behavior of CVD Diamond

Published online by Cambridge University Press:  22 February 2011

M. D. Drory ,
J. F. Gardinier  and
J. M. Pinneo
M. D. Drory
Affiliation:
Crystallume, 125 Constitution Drive, Menlo Park, CA 94025
J. F. Gardinier
Affiliation:
Crystallume, 125 Constitution Drive, Menlo Park, CA 94025
J. M. Pinneo
Affiliation:
Crystallume, 125 Constitution Drive, Menlo Park, CA 94025
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Abstract

The fracture behavior of CVD diamond is examined by indentation experiments in which slow crack growth has been observed. Diamond films of 400μm thickness were prepared by plasma-enhanced CVD on a silicon substrate, subsequently removed from the substrate, and polished for indentation testing. A microhardness tester was used to produce Vickers indentations under low load. Crack length measurements over time revealed susceptibility to slow crack growth in ambient testing conditions. The stress-corrosion susceptibility coefficient, N, was measured as 9.3.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 239: Symposium D – Thin Films: Stresses and Mechanical Properties III , 1991 , 561
Copyright
Copyright © Materials Research Society 1992

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References

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