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Frictional behavior of C60 monolayer films on graphite (HOPG)

Published online by Cambridge University Press:  11 February 2011

S. Okita ,
A. Matsumuro  and
K. Miura
S. Okita
Affiliation:
Department of Microsystem Engineering, Nagoya University, Chikusa, Nagoya 464–8603, Japan
A. Matsumuro
Affiliation:
Department of Microsystem Engineering, Nagoya University, Chikusa, Nagoya 464–8603, Japan
K. Miura
Affiliation:
Department of Physics, Aichi University of Education, Hirosawa 1, Igaya-cho, Kariya 448–8542, Japan
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Abstract

The frictional behavior of a C60 monolayer film between graphite substrates is studied using a homebuilt surface force apparatus. The mean frictional force from the C60 monolayers is estimated to be approximately 2mN, which is one-fifth that of C60 thin films. The C60 monolayer films exhibit a low frictional force of 2mN up to one hundred scans under a normal stress of 8MPa, which indicates that the C60 monolayer film is highly promising for use as a lubricant. Key words, C60 monolayer film, Lubrication, Mechanical properties, Micromachines

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References

REFERENCES

[1] Lüthi, R., Meyer, E., Haefke, H., Howald, L., Gutmannsbauer, W., Güntherodt, H.-J., Science 266 (1994) 1979.Google Scholar
[2] Li, Z. Y., Surf. Sci. 441 (1999) 366.Google Scholar
[3] Matsumuro, A., Takada, Y., Takahashi, Y., Senoo, M., Kondo, I., J. Mater. Sci. Lett. 20 (1999) 1633.Google Scholar
[4] Lüthi, R., Haefke, H., Meyer, E., Hawald, L.. Lang, H.-P., Gerth, G., Güntherodt, H.-J., Z. Phys. B95 (1994) 1.Google Scholar
[5] Lüthi, R., Meyer, E., Haefke, H., Howald, H., Gutmannsbauer, W.. Guggisberg, M., Bammerlin, M., Güntherodt, H.-J., Surf. Sei. 338 (1995) 247.Google Scholar
[6] Schwarz, U.D., Allers, W., Gensterbium, G., Wiesendanger, R.; Phys. Rev B 52 (1995) 14967.Google Scholar
[7] Miura, K., Kamiya, S., Sasaki, N., unpublished.Google Scholar
[8] Israelachvili, J. N., Adams, G. E., Chem. Soc. J. Faraday Trans. 174 (1978) 975.Google Scholar
[9] Okita, S., Ishikawa, M., Miura, K., Surf. Sci. 442 (1999) L959.Google Scholar
[10] Okita, S., Ishikawa, M., Miura, K., Nano Letters 1(2001)101.Google Scholar
[11] Miura, K., Phys. Rev. B52 (1995) 78721.Google Scholar
[12] Miura, K., Maeda, K., Yamada, T., Materials Science Forum 239–241(1997) 663.Google Scholar
[13] Miura, K., Yamada, T., Ishikawa, M., Okita, S., Appl. Surf. Sci. 140(1999) 415.Google Scholar
[14] Gravil, P.A., Devel, M., Lambin, Ph., Bouju, X., Girard, Ch., Lucas, A.A., Phys Rev B53 (1996) 1622.Google Scholar