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Growth of Transition Metal Films on AL(110) Surfaces

Published online by Cambridge University Press:  21 February 2011

R.J. Smith ,
Adli A. Saleh ,
V. Shutthanandan ,
N.R. Shivaparan  and
V. Krasemann
R.J. Smith
Affiliation:
Physics Department, Montana State University, Bozeman, MT 59717
Adli A. Saleh
Affiliation:
Physics Department, Montana State University, Bozeman, MT 59717
V. Shutthanandan
Affiliation:
Electric Propulsion Laboratory, Tuskegee University, Tuskegee, AL 36088
N.R. Shivaparan
Affiliation:
Physics Department, Montana State University, Bozeman, MT 59717
V. Krasemann
Affiliation:
Physics Department, Montana State University, Bozeman, MT 59717
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Abstract

The growth of thin Pd, Ni, Fe and Ti films on Al(110) surfaces has been studied using high-energy ion scattering (HEIS), x-ray photoemission spectroscopy and photoelectron diffraction techniques. Of these four metals, only Ti grows as an epitaxial overlayer, while the other metals mix with the substrate to form surface alloys. In the HEIS experiments the backscattered ion yield from Al surface atoms is measured as a function of metal coverage on the Al surface. A decrease in the Al scattering is observed for Ti deposition while the other metals result in increased Al scattering, attributed to alloy formation. An explanation for the exceptional growth behavior of Ti on Al is provided using a model of surface strain associated with aluminide formation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 399: Symposium D – Evolution of Epitaxial Structure and Morphology , 1995 , 135
Copyright
Copyright © Materials Research Society 1996

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References

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