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Hydrogen Stability in Hydrogenated Amorphous Germanium

Published online by Cambridge University Press:  25 February 2011

W. Beyer ,
J. Herion ,
H. Wagner  and
U. Zastrow
W. Beyer
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, D-5170 Jülich, Federal Republic of Germany
J. Herion
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, D-5170 Jülich, Federal Republic of Germany
H. Wagner
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, D-5170 Jülich, Federal Republic of Germany
U. Zastrow
Affiliation:
Institut für Schicht- und Ionentechnik, Forschungszentrum Jülich GmbH, D-5170 Jülich, Federal Republic of Germany
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Abstract

The thermal stability of hydrogen in hydrogenated amorphous germanium films was studied by hydrogen evolution and by deuterium and hydrogen inter-diffusion experiments. Similar to a-Si:H, the hydrogen stability in a-Ge:H is found to depend strongly on the film structure and on the position of the Fermi level.

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Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 192: Symposium O – Amorphous Silicon Technology - 1990 , 1990 , 689
Copyright
Copyright © Materials Research Society 1990

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References

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