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Influence of Analysis Parameters on the Microstructural Characterization of Nanoscale Precipitates

Published online by Cambridge University Press:  31 January 2011

Ai Serizawa  and
Michael K. Miller
Ai Serizawa
Affiliation:
serizawaa@ornl.gov, Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge, Tennessee, United States
Michael K. Miller
Affiliation:
millermk@ornl.gov, ORNL, MSTD, POB 2008, Oak RIdge, Tennessee, 37831-6136, United States
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Abstract

A series of simulated microstructures containing nanometer-scale precipitates was created with an atom probe simulator. These data were then analyzed with the proximity histogram and the maximum separation method to determine the influence of the particular analysis method. For simulated 2-nm-radius spherical precipitates, the optimized voxel size and delocalization were found to be 0.5-0.6 nm and 1.0-1.5 nm, respectively. Under optimum analysis parameters, the voxelization/delocalization process only slightly degrades the interface width determined from the proximity histogram to ˜0.15±0.04 nm.

Keywords

simulationmicrostructurenanoscale
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1231: Symposium NN – Advanced Microscopy and Spectroscopy Techniques for Imaging Materials with High Spatial Resolution , 2009 , 1231-NN07-03
Copyright
Copyright © Materials Research Society 2010

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References

1 Hellman, O. C., Vandenbroucke, J. A. Van, Rüsing, J., Isheim, D. and Seidman, D. N., Microscopy denbroucke, and Microanalysis, 6 (2000) 437–444.Google Scholar
2 Miller, M. K. and Hyde, J. M., 11th European Congress on Electron Microscopy, August 26-30, 1996, Dublin, Ireland, on CD. Google Scholar