Hostname: page-component-8448b6f56d-dnltx Total loading time: 0 Render date: 2024-04-24T09:19:37.919Z Has data issue: false hasContentIssue false

Influences of hydrogen passivation on NIR photodetection of n-type β-FeSi2/p-type Si heterojunction photodiodes fabricated by facing-targets direct-current sputtering

Published online by Cambridge University Press:  16 January 2012

Kyohei Yamashita
Affiliation:
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
Nathaporn Promros
Affiliation:
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
Ryūhei Iwasaki
Affiliation:
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
Shota Izumi
Affiliation:
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
Tsuyoshi Yoshitake
Affiliation:
Department of Applied Science for Electronics and Materials, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
Get access

Abstract

Hydrogen passivation was applied to the initial epitaxial growth of n-type β-FeSi2 thin films on p-type Si(111) substrates by facing-targets direct-current sputtering (FTDCS) in order to reduced the formation of interface states and terminate dangling bonds in the β-FeSi2 films, and the passivation effects were studied on basis of the electrical evaluation results of the formed n-type β-FeSi2/p-type Si heterojunction photodiodes. The initial growth was made at different gas inflow H2/Ar ratios ranging from 0 to 0.2. The photodetection performance of the photodiode fabricated at the ratio of 0.2 was markedly improved as compared to those of the other samples. The quantum efficiency and detectivity were 2.08 % and 1.75 × 1010 cm√Hz/W, respectively. The sample exhibited the minimum junction capacitance density of 9.2 nF/cm2. The enhanced photodetective performance should be mainly because dangling bonds that act as trap centers for photocarriers are effectively inactivated by the passivation.

Type
Research Article
Copyright
Copyright © Materials Research Society 2012

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Suemasu, T., Negishi, Y., Takahara, K., Hasegawa, F., Jpn. J. Appl. Phys. 39 (2000) L1013 Google Scholar
2. Ugajin, Y., Sunohara, T., Suemasu, T., Thin Solid Films: 515 (2007) 8136.Google Scholar
3. Bost, M. C., and Mahan, J. E., J. Appl. Phys. 58 (1985) 2696.Google Scholar
4. Milosavljevic, M. et al. ., Jpn. J. Appl. Phys. 49 (2010) 081401.Google Scholar
5. Gay, J. M., Stocker, P., and Rethore, F., J. Appl. Phys. 73 (1993) 8169.Google Scholar
6. Gemelli, M., and Miglio, L., Thin Solid Films 380 (2000) 282.Google Scholar
7. Tatar, B., Kutlu, K., and Urgen, M., Thin Solid Films 516 (2007) 13.Google Scholar
8. Suemasu, T., Negishi, Y., Takakura, K., and Hasegawa, F., Jpn. J. Appl. Phys. 33 (2000) L1013.Google Scholar
9. Suzuno, M., Murase, S., Koizumi, T., and Suemasu, T., Appl. Phys. Express 1 (2008) 021403.Google Scholar
10. Yoshitake, T., Inokuchi, Y., Yuri, A., and Nagayama, K., Appl. Phys. Lett. 88 (2006) 182104.Google Scholar
11. Shaban, M., Nakashima, K., Yokoyama, W., and Yoshitake, T., Jpn. J. Appl. Phys. 46 (2007) L667.Google Scholar
12. Shaban, M., Nomoto, K., Izumi, S., and Yoshitake, T., Appl. Phys. Lett. 94 (2009) 222113.Google Scholar
13. Han, M. et al. ., J. Crystal Growth 255 (2003) 93.Google Scholar
14. Shaban, M., Nakashima, K., and Yoshitake, T., Jpn. J. Appl. Phys. 46 (2007) 7708.Google Scholar
15. Collins, C. J. et al. ., Appl. Phys. Lett. 80 (2002) 3754.Google Scholar
16. Mohseni, H., Razeghi, M., Brown, G. J., and Park, Y. S., Appl. Phys. Lett. 78 (2001) 2107.Google Scholar