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Mechanical Properties of Silica Coatings

Published online by Cambridge University Press:  16 February 2011

Kenneth D. Cornett ,
B. D. Fabes  and
W. C. Oliver
Kenneth D. Cornett
Affiliation:
University of Arizona, Department of Materials Science and Engineering, Tucson, AZ 85721
B. D. Fabes
Affiliation:
University of Arizona, Department of Materials Science and Engineering, Tucson, AZ 85721
W. C. Oliver
Affiliation:
Oak Ridge National Laboratories, Metals and Ceramics Division, Oak Ridge, TN 37831
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Abstract

Silica coatings with as-deposited densities ranging from approximately 50-100% were deposited on sapphire substrates by electron beam evaporation and sol-gel techniques. The shrinkage, hardness, and etch rates of the coatings were measured after various heat treatments. Differences in shrinkage indicated that hardness was not controlled by bulk porosity alone. Most films exhibited a surface “crust” that was significantly harder, and etched more slowly than the interior of the sample. We propose that the differences in mechanical and chemical behavior are caused by Si-O network reorganization starting at the film/air interface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 188: Symposium K – Thin Films: Stresses and Mechanical Properties II , 1990 , 133
Copyright
Copyright © Materials Research Society 1990

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References

REFERENCES

1. Pliskin, W.A., and Castrucci, P.P., Electrochemical Technology, 6(1968), p.85.Google Scholar
2. Pliskin, W.A., and Lehman, H.S., J. Electrochem. Soc., 112(1965), p. 1013.Google Scholar
3. Pliskin, W.A., J. Vac. Sci. Tech., 14(1977), p. 1064.Google Scholar
4. Pulker, H.K., Gunther, K.H., Vakuum-Technik, 21(1972), p. 201.Google Scholar
5. Krongelb, S., Electrochem. Tech., 6(1968), p. 251.Google Scholar
6. Allen, Thomas H., Proc. SPIE, Optical Thin Films, 325(1982), p. 93.Google Scholar
7. Fitch, J.T., Bjorkman, C.H., Summakeris, J.J., and Lucovsky, G., Mat. Res. Soc. Symp. Proc., 130(1989), p. 289.Google Scholar
8. Fabes, B.D., Oliver, W.C., To be published in J. Noncrystalline Solids, (1990).Google Scholar
9. Pethica, J.B., and Oliver, W.C., Mat. Res. Soc. Symp. Proc., 130(1989), p. 13.Google Scholar
10. Doerner, M.F., and Nix, W.D., J. Mater. Res., 1(1986), p. 601.Google Scholar
11. Kingery, W.D., Bowen, H.K., Uhlmann, D.R., Introduction to Ceramics, John-Wiley & Sons, (1976), p. 594.Google Scholar