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Microstructure and Surface Morphology of Ag and Au Films Grown on Hydrogen-Terminated Si(111) Substrates

Published online by Cambridge University Press:  21 February 2011

R. Naik
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
G. W. Auner
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
S. Gebremariam
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
A. Tatham
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
B. U. M. Rao
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
Y. S. Lu
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
Z. L. Wu
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
P. K. Kuo
Affiliation:
Dept. of Physics, Wayne state university, Detroit, MI 48202
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Abstract

Reflection high energy electron diffraction (RHEED) and x-ray diffraction (XRD) studies on Ag and Au films grown on hydrogen terminated Si(111) substrates at room temperature indicate a <111> oriented growth. Atomic force microscopy (AFM) data reveal a smooth surface morphology for both Ag and Au films after annealing at 275°C and 175°C for 1 hour, as compared to films without annealing. High resolution transmission electron microscopy (HREM) was employed to examine the annealed samples. HREM studies show a highly uniform film with abrupt interface for Ag/Si(111). On the other hand, Au/Si(111) shows several twin formations both at the interface and in the bulk of the film.

Type
Research Article
Copyright
Copyright © Materials Research Society 1995

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