Nanosphere lithography was used to form a nano-scaled SiO2 template on a GaAs substrate. Especially, a simple method for fabricating nanopatterns with multi feature sizes within one step has been invented. These nanopatterns, as a template, can be used to grow selectively ordered nanostructures arrays such as quantum dots, quantum bars with different feature sizes in one step. Two sized In0.25Ga0.75As nano-bar arrays have been successfully grown on a GaAs substrate by MOCVD.
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