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MOCVD of Field Emission Phosphors using a Liquid Delivery System

Published online by Cambridge University Press:  10 February 2011

T. S. Moss ,
B. F. Espinoza ,
K. V. Salazar  and
R. C. Dye
T. S. Moss
Affiliation:
M.S. E549, Los Alamos National Laboratory, Los Alamos, NM 87545
B. F. Espinoza
Affiliation:
M.S. E549, Los Alamos National Laboratory, Los Alamos, NM 87545
K. V. Salazar
Affiliation:
M.S. E549, Los Alamos National Laboratory, Los Alamos, NM 87545
R. C. Dye
Affiliation:
M.S. E549, Los Alamos National Laboratory, Los Alamos, NM 87545
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Abstract

Thin film phosphors for field emission displays show the potential to overcome the life-limiting problems that traditional powders face because of their high surface areas. By depositing a fully dense thin film, the surface area can be dramatically reduced, while the electrical and thermal conductivity is increased. Metal organic chemical vapor deposition offers the ability to deposit high quality, dense films that are crystalline-as-deposited and at temperatures low enough to allow for inexpensive glass. Deposition has been produced from mixtures of Y(tmhd)3, TEOS, Tb(tmhd)3, and O2 using a liquid delivery system. Coatings were shown to be composed of Y, Si, and Tb by x-ray fluorescence, but x-ray diffraction did not show any crystallinity. Excitation using radioluminescence produced a peak in the visible green at approximately 540 nm, indicative of the excitation of Tb3+. The morphology of the deposition was smooth, with surface features on the order of one micron and below. Some limited microcracking was also observed in the morphology because of the thermal expansion mismatch.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 495: Symposium W – Chemical Aspects of Electronic Ceramics Processing , 1997 , 311
Copyright
Copyright © Materials Research Society 1998

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References

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