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The Modification of the Abrasion Resistance of Type IIa (110) Diamond Using Carbon and Nitrogen Implantation

Published online by Cambridge University Press:  25 February 2011

Gregory C. Anderson ,
Steven Prawer  and
Peter N. Johnston
Gregory C. Anderson
Affiliation:
Department of Applied Physics and Microelectronics and Materials Technology Centre, Royal Melbourne Institute of Technology, G.P.O Box 2476V, Melbourne. Victoria, 3001, AUSTRALIA.
Steven Prawer
Affiliation:
School of Physics, University of Melbourne, Parkville, Victoria, 3052, AUSTRALIA.
Peter N. Johnston
Affiliation:
Department of Applied Physics and Microelectronics and Materials Technology Centre, Royal Melbourne Institute of Technology, G.P.O Box 2476V, Melbourne. Victoria, 3001, AUSTRALIA.
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Abstract

The modification of the wear properties of type Ha diamond following ion implantation with 100 keV carbon and nitrogen has been studied at implantation temperatures of 150 and 470 K. Abrasion testing using low load multiple pass scratch testing with a Rockwell diamond indenter has shown a decrease in wear resistance. Microstructural modifications resulting from ion implantation have been assessed using Channeling Rutherford Backscattering Spectroscopy (C-RBS). No correlation was found between the presence of ion beam induced point defects (as measured by C-RBS) and the increase in wear. There are no obvious wear rate differences observed for nitrogen or carbon implantation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 242: Symposium G – Wide Band-Gap Semiconductors , 1992 , 171
Copyright
Copyright © Materials Research Society 1992

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References

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