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Morphological and Structural Evolution of an Ultra-low-k Dielectric During the Porogen Removal

Published online by Cambridge University Press:  01 February 2011

Diane Rebiscoul ,
Héléne Trouvé ,
Bruno Remiat ,
Laurence Clerc ,
Didier Louis  and
Gerard Passemard
Diane Rebiscoul
Affiliation:
diane.rebiscoul@cea.fr, CEA, LETI, 17 rue des Martyrs, Grenoble, France, 38054, France, 33 4 38 78 10 59, 33 4 38 78 30 34
Héléne Trouvé
Affiliation:
htrouve@rohmhass.com, Rohm and Haas Electronic Material LLC, Grenoble, France, 38054, France
Bruno Remiat
Affiliation:
bruno.remiat@cea.fr, CEA, LITEN, 17 rue des Martyrs, Grenoble, Isere, 38054, France
Laurence Clerc
Affiliation:
laurence.clerc@cea.fr, CEA, LETI, 17 rue des martyrs, Grenoble, Isere, 38054, France
Didier Louis
Affiliation:
didier.louis@cea.fr, CEA, LETI, 17 rue des martyrs, Grenoble, Isere, 38 054, France
Gerard Passemard
Affiliation:
gerard.passemard@cea.fr, STmicroelectronic, LETI, 17 rue des Martyrs, Grenoble, Isere, 38054, France
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Abstract

The use of porous ultra-low-k materials between interconnections for sub 45nm technologies has introduced some barrier diffusion and mechanical problems. In order to avoid the problems caused by the porosity, a hybrid dense material (porogen and matrix) can be used in an alternate integration scheme. In this approach, the porogen is removed after CMP steps by a thermal cure or UV assisted thermal cure. In this work, we have first characterized the impact of the temperature and the duration of the thermal cure on the material. The crosslinking degree increases and the porogen amount decreases with increasing cure temperature. The most important impact of the curing duration happens between 350°C and 400°C. The increase of the curing duration leads to an increase of the porogen loss and a decrease of the refractive index. Secondly, in order to assess the structure of the layer as a function of the depth, the material was etched in a 0.05% HF solution and then characterized. According to the temperature and duration of the cure, the etch-rate can vary as a function of the material depth. This variation is related to a complex gradient inside the material.

Keywords

dielectricmorphologyspecific heat
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 914: Symposium F – Materials, Technology and Reliability of Low-k Dielectrics and Copper Interconnects , 2006 , 0914-F02-04
Copyright
Copyright © Materials Research Society 2006

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