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Nano-Patterning of Graphene Structures Using Highly Focused Beams of Gallium Ions

Published online by Cambridge University Press:  01 February 2011

Jacques Gierak ,
Damien Lucot ,
Abdelkarim Ouerghi ,
Gilles Patriarche ,
Eric Bourhis ,
Giancarlo Faini  and
Dominique Mailly
Jacques Gierak
Affiliation:
jacques.gierak@lpn.cnrs.fr, LPN CNRS, Route de Nozay, Marcoussis, 91460, France
Damien Lucot
Affiliation:
damien.lucot@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
Abdelkarim Ouerghi
Affiliation:
abdelkarim.ouerghi@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
Gilles Patriarche
Affiliation:
gilles.patriarche@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
Eric Bourhis
Affiliation:
eric.bourhis@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
Giancarlo Faini
Affiliation:
giancarlo.faini@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
Dominique Mailly
Affiliation:
Dominique.Mailly@lpn.cnrs.fr, LPN CNRS, Marcoussis, France
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Abstract

Graphene is generating a considerable interest in materials science and condensed-matter physics. One crucial technological problem, that will govern future applicability of this material, is related to the patterning of graphene while preserving the exceptionally high crystallinity and electronic properties of this material. This article is aiming at demonstrating that a highly focused beam of gallium ions can be applied for sculpting ultra-thin and high quality suspended graphene nano-ribbons (GNRs).

Keywords

ion-beam processingion-solid interactionsmicroelectronics

Information

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1259: Symposium S – Graphene Materials and Devices , 2010 , 1259-S18-04
Copyright
Copyright © Materials Research Society 2010

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